Optimizing the performance of Sn–Cu alloys via microalloying with Ni and Zn: a study on microstructure, thermal, and mechanical properties

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-01-13 DOI:10.1007/s10854-024-14118-7
H. N. Soliman, A. M. El-Taher, M. Ragab, K. B. Mashaly, M. Amin
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Abstract

Microalloying is a critical technique for improving lead-free interconnections in electronic devices, as it selectively incorporates elements and significantly modifies the solidification structure. The current work investigates the effects of microalloying with Ni and Zn on the microstructures, thermal properties, and mechanical properties of Sn–0.7-wt% Cu solder alloy. The following experimental techniques were employed to evaluate the samples of Sn–0.7-wt% Cu alloy: scanning electron microscopy (SEM), optical microscopy (OM), X-ray diffraction (XRD), tensile tests, and differential scanning calorimetry (DSC). The experimental findings indicated that trace addition of Ni (0.05 wt%) could facilitate the formation of (Cu,Ni)6Sn5 IMCs in the interdendritic region, consequently refining the coarse β-Sn phase and resulting in a more refined grain structure. The addition of Zn (2.0 wt%) significantly affected the as-solidified microstructure, leading to the dissolution of Zn into Cu6Sn5 intermetallic compounds, characterized by both fine and coarse eutectic regions. Moreover, Cu5Zn8 phases were generated between the eutectic region and the refined β-Sn phase. The collaborative effect of Ni and Zn on Sn–0.7Cu alloy markedly improves its microstructure, leading to a refined, stable, and fine-grained Cu6Sn5 IMC. Additionally, the mechanical properties of the Sn–Cu alloy are enhanced by these structural differences. The results of tensile tests indicate that the Sn–0.7Cu–0.05Ni–2.0Zn solder alloy has superior mechanical properties in comparison to the Sn–Cu alloy. Specifically, the estimated increases in modulus of elasticity (EM), yield strength (YS), and ultimate tensile strength (UTS) are 375.47%, 19%, and 46.67%, respectively. However, this improvement in mechanical properties was accompanied by a decrease in ductility. The increased strength of Ni/Zn alloys was ascribed to the pinning action of (Cu,Ni)6Sn5 and Cu5Zn8 IMCs, which impede grain growth and the formation of interfacial IMCs. The DSC results showed slightly decrease in melting temperature values, with the additions of Ni and Zn resulting in values that were approximately 2.1 °C lower than those of the binary Sn–Cu alloys. In view of the results, this study offers important perspectives on soldering technology, which will help in the practical aspects of future soldering process strategies.

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通过Ni和Zn微合金化优化Sn-Cu合金的性能:显微组织、热性能和力学性能研究
微合金化是改善电子器件无铅互连的关键技术,因为它可以选择性地结合元素并显着改变凝固组织。本文研究了Ni和Zn微合金化对sn - 0.7 wt% Cu钎料合金组织、热性能和力学性能的影响。采用扫描电镜(SEM)、光学显微镜(OM)、x射线衍射(XRD)、拉伸试验和差示扫描量热法(DSC)等实验技术对sn - 0.7 wt% Cu合金样品进行了表征。实验结果表明,微量Ni (0.05 wt%)的加入可以促进枝晶间区(Cu,Ni)6Sn5 IMCs的形成,从而细化粗糙的β-Sn相,使晶粒结构更加细化。添加Zn (2.0 wt%)显著影响了Cu6Sn5的凝固态组织,导致Zn溶解为Cu6Sn5金属间化合物,其特征为细共晶区和粗共晶区。在共晶区与细化后的β-Sn相之间生成Cu5Zn8相。Ni和Zn对Sn-0.7Cu合金的协同作用显著改善了合金的显微组织,形成了细化、稳定、细晶的Cu6Sn5 IMC。此外,Sn-Cu合金的力学性能也因这些结构差异而提高。拉伸试验结果表明,Sn-0.7Cu-0.05Ni-2.0Zn钎料合金的力学性能优于Sn-Cu合金。其中,弹性模量(EM)、屈服强度(YS)和极限抗拉强度(UTS)的估计增幅分别为375.47%、19%和46.67%。然而,这种机械性能的改善伴随着延展性的下降。Ni/Zn合金强度的提高是由于(Cu,Ni)6Sn5和Cu5Zn8 IMCs的钉住作用,阻碍了晶粒长大和界面IMCs的形成。DSC结果显示,合金的熔点温度略有下降,Ni和Zn的加入使合金的熔点温度比二元Sn-Cu合金的熔点温度低约2.1℃。结果表明,本研究为焊接技术提供了重要的观点,这将有助于未来焊接工艺策略的实践。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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