Silicon-based narrowband photodetectors with blade-coated perovskite light extinction layer for high performance visible-blind NIR detection

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-03-01 DOI:10.1007/s10854-025-14454-2
Qihao Huang, Liting Tao, Hongliang Zhu, Wenxin Lin, Jianjun Chen, Yanjun Fang
{"title":"Silicon-based narrowband photodetectors with blade-coated perovskite light extinction layer for high performance visible-blind NIR detection","authors":"Qihao Huang,&nbsp;Liting Tao,&nbsp;Hongliang Zhu,&nbsp;Wenxin Lin,&nbsp;Jianjun Chen,&nbsp;Yanjun Fang","doi":"10.1007/s10854-025-14454-2","DOIUrl":null,"url":null,"abstract":"<div><p>NIR narrowband imaging is highly desirable for its applications in biological sensing, environmental monitoring and military defense. Unfortunately, it cannot be fulfilled by the most widely used silicon-based photodetectors due to their broadband response. Herein, we present novel silicon-based narrowband photodetectors (Si-NBPDs) with the wavelength response ranging from 800 to 1200 nm, by integrating the perovskite light extinction layer with the Si-based metal–semiconductor-metal photodetectors. The perovskite layer was prepared by a low-cost and scalable methylamine-assisted blading-coating method, and its thickness was comprehensively modulated to achieve the highest visible to NIR rejection ratio up to 120. Impressively, these Si-NBPDs exhibited a high sensitivity with the lowest detectable light intensity down to 200 pW·cm<sup>−2</sup>, a fast response speed with rise/fall time of 11/68 µs, and a large liner dynamic range of 120 dB. Furthermore, the proof-of-concept NIR imaging test exhibited that this photodetector was immune to visible background influence, which shows its promising applications in biological fluorescence imaging as the NIR-I&amp;II windows.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 7","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-025-14454-2","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
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Abstract

NIR narrowband imaging is highly desirable for its applications in biological sensing, environmental monitoring and military defense. Unfortunately, it cannot be fulfilled by the most widely used silicon-based photodetectors due to their broadband response. Herein, we present novel silicon-based narrowband photodetectors (Si-NBPDs) with the wavelength response ranging from 800 to 1200 nm, by integrating the perovskite light extinction layer with the Si-based metal–semiconductor-metal photodetectors. The perovskite layer was prepared by a low-cost and scalable methylamine-assisted blading-coating method, and its thickness was comprehensively modulated to achieve the highest visible to NIR rejection ratio up to 120. Impressively, these Si-NBPDs exhibited a high sensitivity with the lowest detectable light intensity down to 200 pW·cm−2, a fast response speed with rise/fall time of 11/68 µs, and a large liner dynamic range of 120 dB. Furthermore, the proof-of-concept NIR imaging test exhibited that this photodetector was immune to visible background influence, which shows its promising applications in biological fluorescence imaging as the NIR-I&II windows.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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