Scrutinization of cobalt-doped CuGaS2 thin films prepared by spray pyrolysis method for photodetection applications

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-02-19 DOI:10.1007/s10854-025-14425-7
M. Balachandran, C. Thiyakarajan, K. Sethuraman
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Abstract

Visible photodetectors are essentially utilized in optical communications and image sensing. CuGaS2 is a ternary chalcopyrite system comprising greater absorption coefficient and direct bandgap is a suitable semiconductor for photodetector applications. Here, we present the preparation of pristine and Cobalt-doped CuGaS2 (0.5, 1.0, 1.5 wt.%) thin film photodetectors using chemical spray pyrolysis method. Structural studies affirm the pure phase of CuGaS2 and the incorporation of Cobalt dopants. Morphological studies confirm the presence of dopants on the CuGaS2 lattice. Optical studies show the bandgap reduction due to Co doping which enhances photon absorption. The quick response under light illumination of the photodetectors is scrutinized by photoresponse studies at low power density of 4 mW/cm2 and operation bias of 1 V. Responsivity and detectivity of pristine and Co-doped CuGaS2 thin film photodetectors were determined and all devices show outstanding photoresponse in spite of having higher active area (1 cm2). Notably, the 1.0 wt.% Co-doped CuGaS2 device show highest responsivity and detectivity of 2.40 µAW−1 and 3.52 × 107 Jones respectively despite having low operation bias and higher active area. The tuning of optical and electrical properties via doping resulted in this higher output. Therefore, Cobalt-doped CuGaS2 thin films has great potential in advancing high performance photodetectors.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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