{"title":"Scrutinization of cobalt-doped CuGaS2 thin films prepared by spray pyrolysis method for photodetection applications","authors":"M. Balachandran, C. Thiyakarajan, K. Sethuraman","doi":"10.1007/s10854-025-14425-7","DOIUrl":null,"url":null,"abstract":"<div><p>Visible photodetectors are essentially utilized in optical communications and image sensing. CuGaS<sub>2</sub> is a ternary chalcopyrite system comprising greater absorption coefficient and direct bandgap is a suitable semiconductor for photodetector applications. Here, we present the preparation of pristine and Cobalt-doped CuGaS<sub>2</sub> (0.5, 1.0, 1.5 wt.%) thin film photodetectors using chemical spray pyrolysis method. Structural studies affirm the pure phase of CuGaS<sub>2</sub> and the incorporation of Cobalt dopants. Morphological studies confirm the presence of dopants on the CuGaS<sub>2</sub> lattice. Optical studies show the bandgap reduction due to Co doping which enhances photon absorption. The quick response under light illumination of the photodetectors is scrutinized by photoresponse studies at low power density of 4 mW/cm<sup>2</sup> and operation bias of 1 V. Responsivity and detectivity of pristine and Co-doped CuGaS<sub>2</sub> thin film photodetectors were determined and all devices show outstanding photoresponse in spite of having higher active area (1 cm<sup>2</sup>). Notably, the 1.0 wt.% Co-doped CuGaS<sub>2</sub> device show highest responsivity and detectivity of 2.40 µAW<sup>−1</sup> and 3.52 × 10<sup>7</sup> Jones respectively despite having low operation bias and higher active area. The tuning of optical and electrical properties via doping resulted in this higher output. Therefore, Cobalt-doped CuGaS<sub>2</sub> thin films has great potential in advancing high performance photodetectors.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 5","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-02-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s10854-025-14425-7.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-025-14425-7","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Visible photodetectors are essentially utilized in optical communications and image sensing. CuGaS2 is a ternary chalcopyrite system comprising greater absorption coefficient and direct bandgap is a suitable semiconductor for photodetector applications. Here, we present the preparation of pristine and Cobalt-doped CuGaS2 (0.5, 1.0, 1.5 wt.%) thin film photodetectors using chemical spray pyrolysis method. Structural studies affirm the pure phase of CuGaS2 and the incorporation of Cobalt dopants. Morphological studies confirm the presence of dopants on the CuGaS2 lattice. Optical studies show the bandgap reduction due to Co doping which enhances photon absorption. The quick response under light illumination of the photodetectors is scrutinized by photoresponse studies at low power density of 4 mW/cm2 and operation bias of 1 V. Responsivity and detectivity of pristine and Co-doped CuGaS2 thin film photodetectors were determined and all devices show outstanding photoresponse in spite of having higher active area (1 cm2). Notably, the 1.0 wt.% Co-doped CuGaS2 device show highest responsivity and detectivity of 2.40 µAW−1 and 3.52 × 107 Jones respectively despite having low operation bias and higher active area. The tuning of optical and electrical properties via doping resulted in this higher output. Therefore, Cobalt-doped CuGaS2 thin films has great potential in advancing high performance photodetectors.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.