{"title":"Comparison of the characteristics of tunneling oxide and tunneling ON for p-channel nano-crystal memory","authors":"Kwangseok Han, Ilgweon Kim, Hyungcheol Shin","doi":"10.1109/ICVC.1999.820889","DOIUrl":null,"url":null,"abstract":"The nano-crystal memory operates at low voltage compared to conventional flash memory due to thinner tunneling dielectrics since the spacing between the Si dots suppresses the charge loss through lateral paths. Recently, p-channel nano-crystal memory, which stores holes instead of electrons as the information, has been reported to have good characteristics compared with EEPROM. In this paper, the characteristics of tunneling oxide and tunneling ON is compared for p-channel nano-crystal memory.","PeriodicalId":13415,"journal":{"name":"ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361)","volume":"13 1","pages":"233-236"},"PeriodicalIF":0.0000,"publicationDate":"1999-10-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICVC.1999.820889","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The nano-crystal memory operates at low voltage compared to conventional flash memory due to thinner tunneling dielectrics since the spacing between the Si dots suppresses the charge loss through lateral paths. Recently, p-channel nano-crystal memory, which stores holes instead of electrons as the information, has been reported to have good characteristics compared with EEPROM. In this paper, the characteristics of tunneling oxide and tunneling ON is compared for p-channel nano-crystal memory.
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