C. Viera, B. Gurcan, K. Crocker, P. Todd, K. Lewis
{"title":"BF/sub 2//sup +/ implant: a fluorine bubble induced ET failure","authors":"C. Viera, B. Gurcan, K. Crocker, P. Todd, K. Lewis","doi":"10.1109/ASMC.2002.1001588","DOIUrl":null,"url":null,"abstract":"Fluorine bubbles are a known result of BF/sub 2//sup +/ high energy implants. This work presents a failure mechanism induced by gross fluorine bubbles, that allows poly silicon to be damaged during its subsequent cobalt silicide etch. An alternative implant that includes both BF/sub 2//sup +/ and B11 may alleviate the effects of F precipitates without eliminating the benefits of BF/sub 2//sup +/ self-amorphizing the substrate.","PeriodicalId":64779,"journal":{"name":"半导体技术","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2002-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"半导体技术","FirstCategoryId":"1087","ListUrlMain":"https://doi.org/10.1109/ASMC.2002.1001588","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Fluorine bubbles are a known result of BF/sub 2//sup +/ high energy implants. This work presents a failure mechanism induced by gross fluorine bubbles, that allows poly silicon to be damaged during its subsequent cobalt silicide etch. An alternative implant that includes both BF/sub 2//sup +/ and B11 may alleviate the effects of F precipitates without eliminating the benefits of BF/sub 2//sup +/ self-amorphizing the substrate.
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