Yield/reliability enhancement using automated minor layout modifications

G. A. Allan
{"title":"Yield/reliability enhancement using automated minor layout modifications","authors":"G. A. Allan","doi":"10.1109/ASMC.2002.1001614","DOIUrl":null,"url":null,"abstract":"This paper reports a new layout modification tool for the automation of yield and reliability enhancement of IC layout. The peye tool combines the eye (Edinburgh Yield Estimator) with Perl (Practical Extraction and Reporting Language). This new tool permits complex layout modification operations to be defined using the powerful language features of Perl. The new peye tool has been interfaced with a sampling based yield prediction system to enable the measurement of the layout modifications and yield predictions based on these modifications. This enables the usefulness of a modification to a particular design to be assessed before use. Both the sampled measurement and the final modifications to the whole chip database can be farmed out to a number of networked computers, enabling the system to assess and apply layout modifications to large industrial ICs in a reasonable time. Results of layout modifications are presented.","PeriodicalId":64779,"journal":{"name":"半导体技术","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2002-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"半导体技术","FirstCategoryId":"1087","ListUrlMain":"https://doi.org/10.1109/ASMC.2002.1001614","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6

Abstract

This paper reports a new layout modification tool for the automation of yield and reliability enhancement of IC layout. The peye tool combines the eye (Edinburgh Yield Estimator) with Perl (Practical Extraction and Reporting Language). This new tool permits complex layout modification operations to be defined using the powerful language features of Perl. The new peye tool has been interfaced with a sampling based yield prediction system to enable the measurement of the layout modifications and yield predictions based on these modifications. This enables the usefulness of a modification to a particular design to be assessed before use. Both the sampled measurement and the final modifications to the whole chip database can be farmed out to a number of networked computers, enabling the system to assess and apply layout modifications to large industrial ICs in a reasonable time. Results of layout modifications are presented.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
使用自动化的小布局修改来提高产量和可靠性
本文报道了一种新的版图修改工具,用于集成电路版图的成品率和可靠性的自动化提高。peye工具结合了eye (Edinburgh Yield Estimator)和Perl (Practical Extraction and Reporting Language)。这个新工具允许使用Perl强大的语言特性定义复杂的布局修改操作。新的peye工具与基于采样的产量预测系统相结合,可以测量布局修改并根据这些修改进行产量预测。这样就可以在使用前评估对特定设计进行修改的有用性。采样测量和对整个芯片数据库的最终修改都可以外包给许多联网的计算机,使系统能够在合理的时间内评估和应用大型工业ic的布局修改。给出了布局修改的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
8436
期刊最新文献
A manufacturable shallow trench isolation process for sub-0.2 um DRAM technologies Ultra-dilute silicon wafer clean chemistry for fabrication of RF microwave devices Planarization yield limiters for wafer-scale 3D ICs Statistical modeling and analysis of wafer test fail counts An approach for improving yield with intentional defects
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1