Q. Luo, Jie Yu, Xumeng Zhang, K. Xue, J. Yuan, Yan Cheng, Tiancheng Gong, H. Lv, Xiaoxin Xu, Peng Yuan, Jiahao Yin, L. Tai, S. Long, Qi Liu, X. Miao, Jing Li, Ming Liu
{"title":"Nb1-xO2 based Universal Selector with Ultra-high Endurance (>1012), high speed (10ns) and Excellent Vth Stability","authors":"Q. Luo, Jie Yu, Xumeng Zhang, K. Xue, J. Yuan, Yan Cheng, Tiancheng Gong, H. Lv, Xiaoxin Xu, Peng Yuan, Jiahao Yin, L. Tai, S. Long, Qi Liu, X. Miao, Jing Li, Ming Liu","doi":"10.23919/VLSIT.2019.8776546","DOIUrl":null,"url":null,"abstract":"In this work, we demonstrate a high performance Nb<inf>1-</inf><inf>x</inf>O<inf>2</inf> based selector with thermal feedback mechanism for 3D X-point application. Ultra-high endurance <tex>$(> 10^{12})$</tex>, high operation speed (10ns), bidirectional operation and excellent V<inf>th</inf> stability were achieved. By adding a barrier layer between Nb<inf>1-x</inf>O<inf>2</inf> film and electrode, the off-state leakage current was reduced by one order of magnitude (selectivity as high as 500). This work provides a universal selector solution for various emerging memories, including RRAM, MRAM and PCM.","PeriodicalId":6752,"journal":{"name":"2019 Symposium on VLSI Technology","volume":"1 1","pages":"T236-T237"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"18","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/VLSIT.2019.8776546","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 18
Abstract
In this work, we demonstrate a high performance Nb1-xO2 based selector with thermal feedback mechanism for 3D X-point application. Ultra-high endurance $(> 10^{12})$, high operation speed (10ns), bidirectional operation and excellent Vth stability were achieved. By adding a barrier layer between Nb1-xO2 film and electrode, the off-state leakage current was reduced by one order of magnitude (selectivity as high as 500). This work provides a universal selector solution for various emerging memories, including RRAM, MRAM and PCM.