Jongwan Jung, Byung-Sung Song, Ki-Wuk Nam, Sang-Wuk Ha, Dae-Byung Kim
{"title":"Dramatic reduction of plasma induced damage using 2-step power down method in metal etch process","authors":"Jongwan Jung, Byung-Sung Song, Ki-Wuk Nam, Sang-Wuk Ha, Dae-Byung Kim","doi":"10.1109/ICVC.1999.820974","DOIUrl":null,"url":null,"abstract":"For the first time it is shown that charging damage during RF power turn-off is as severe as steady state charging in both MERIE and ICP system. A newly proposed 2-step power down method dramatically reduced the charging damage during rf power turn-off. Moreover this method has shown highly reproducible results.","PeriodicalId":13415,"journal":{"name":"ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361)","volume":"43 1","pages":"476-479"},"PeriodicalIF":0.0000,"publicationDate":"1999-10-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICVC.1999.820974","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
For the first time it is shown that charging damage during RF power turn-off is as severe as steady state charging in both MERIE and ICP system. A newly proposed 2-step power down method dramatically reduced the charging damage during rf power turn-off. Moreover this method has shown highly reproducible results.
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