Exploring W-Cu hybrid dual damascene metallization for future nodes

M. H. van der Veen, O. Pedreira, N. Heylen, N. Jourdan, S. Lariviere, S. Park, H. Struyf, Z. Tokei, W. Lei, S. Pethe, S. Hwang, F. Chen, Z. Wu, J. Machillot, A. Cockburn, A. Jansen
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引用次数: 1

Abstract

In this exploratory study, selective tungsten (W) deposition is used before the copper (Cu) metallization steps with the aim to solely fill the via with W. The W deposition is tested on the bottom metal cobalt (Co) or ruthenium (Ru) and shows an excellent selectivity towards the dielectric SiO2 and dense low-k material 3.0. The via resistance shows up to a 40% reduction for the W-Cu hybrid system compared to a Cu dual damascene (DD) filled via. The material compatibility is tested in a thermal storage study and shows no performance degradation of the bottom barrierless W vias. This feasibility study using a middle of line (MOL) metal shows that a W-Cu hybrid system can be an option for further extension of Cu interconnects while suppressing the via resistance.
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探索未来节点的W-Cu杂化双大马士革金属化
在本探索性研究中,在铜(Cu)金属化步骤之前使用选择性钨(W)沉积,目的是将W完全填满通孔。W沉积在底部金属钴(Co)或钌(Ru)上进行测试,对介电SiO2和致密低k材料3.0表现出优异的选择性。与Cu双大马士革(DD)填充的通孔相比,W-Cu混合系统的通孔电阻降低了40%。在热存储研究中测试了材料相容性,并显示底部无障碍W孔的性能没有下降。这项使用中线(MOL)金属的可行性研究表明,W-Cu混合系统可以在抑制通孔电阻的同时进一步扩展Cu互连。
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