A hierarchical approach to cost analysis for next generation semiconductor processes

R. Sandell, N. Pierce
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引用次数: 1

Abstract

Introduction of next generation semiconductor technologies gets progressively harder and more expensive with each node in the Semiconductor Industry Association (SIA) roadmap. True to tradition, the 0.1-micron node promises to provide a new set of processing complexities and significant capital investment as well as associated manufacturing costs. We have developed a methodology to analyze different process and equipment alternatives, in order to ultimately reduce the capital investment and overall manufacturing cost of wafers through this process. This approach is hierarchical in nature; in other words, it first aids with analysis of alternatives at a process step level and then these results are incorporated in the analysis of the total wafer and die cost at the macro process flow level. A Visual Basic based tool has been developed to enable this analysis.
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下一代半导体制程成本分析的分层方法
随着半导体工业协会(SIA)路线图上的每个节点,下一代半导体技术的引入变得越来越困难和昂贵。与传统一样,0.1微米节点有望带来一系列新的加工复杂性、大量的资本投资以及相关的制造成本。我们已经开发了一种方法来分析不同的工艺和设备选择,以便最终通过这一过程减少资本投资和晶圆的整体制造成本。这种方法本质上是分层的;换句话说,它首先有助于分析工艺步骤级别的替代方案,然后将这些结果纳入宏观工艺流程级别的晶圆和模具总成本分析中。开发了一个基于Visual Basic的工具来实现这种分析。
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