Changmin Jeon, Jongsung Woo, Kyongsik Yeom, Minji Seo, Eunmi Hong, Youngcheon Jeong, Sangjin Lee, Hongkook Min, DalHwan Kim, Hyun-Yong Lee, Soomin Cho, Myeonghee Oh, Jisung Kim, Hyosang Lee, Jinchul Park, Cheol Kim, Hyukjun Sung, Se-Joon Yoon, Joonsuk Kim, Yong Kyu Lee, K. Park, G. Jeong, J. Yoon, E. Jung
{"title":"High-speed and Ultra-low Power IoT One-chip (MCU + Connectivity-chip) on a Robust 28-nm Embedded Flash Process","authors":"Changmin Jeon, Jongsung Woo, Kyongsik Yeom, Minji Seo, Eunmi Hong, Youngcheon Jeong, Sangjin Lee, Hongkook Min, DalHwan Kim, Hyun-Yong Lee, Soomin Cho, Myeonghee Oh, Jisung Kim, Hyosang Lee, Jinchul Park, Cheol Kim, Hyukjun Sung, Se-Joon Yoon, Joonsuk Kim, Yong Kyu Lee, K. Park, G. Jeong, J. Yoon, E. Jung","doi":"10.23919/VLSIT.2019.8776557","DOIUrl":null,"url":null,"abstract":"Based on robust 28-nm embedded flash (eFlash) process, IoT One-chip for high-speed and low power applications which MCU-chip (10Mb eFlash) and connectivity-chip (BLE/Zigbee) are integrated for the first time. By introducing new devices on 28-nm low-power eFlash process, high-speed ($> 40\\text{MHz}$ random read), ultra-low power $(< 3\\text{uA}$ sleep mode current, 10/13mA RF current at $\\text{Tx}/\\text{Rx}$ mode) and robust reliability $(-40\\sim 125^{\\text{o}}\\text{C}$ stable operation, $100\\text{K}$ cycle endurance, 150C/RT retention up to 200K hours) are achieved. LDD-first IO transistor with low Vth (~0.5V) for low-Vdd (~1.0V) operation [1] and ultra-low leakage (ULL) SRAM bit-cell (0.1x vs. normal) supporting low sleep mode chip current are applied to extend battery life-time. Stable endurance and high (/low)-temperature retention after cycling stress are achieved by robust split-gate type eFlash cell.","PeriodicalId":6752,"journal":{"name":"2019 Symposium on VLSI Technology","volume":"31 1","pages":"T114-T115"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/VLSIT.2019.8776557","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Based on robust 28-nm embedded flash (eFlash) process, IoT One-chip for high-speed and low power applications which MCU-chip (10Mb eFlash) and connectivity-chip (BLE/Zigbee) are integrated for the first time. By introducing new devices on 28-nm low-power eFlash process, high-speed ($> 40\text{MHz}$ random read), ultra-low power $(< 3\text{uA}$ sleep mode current, 10/13mA RF current at $\text{Tx}/\text{Rx}$ mode) and robust reliability $(-40\sim 125^{\text{o}}\text{C}$ stable operation, $100\text{K}$ cycle endurance, 150C/RT retention up to 200K hours) are achieved. LDD-first IO transistor with low Vth (~0.5V) for low-Vdd (~1.0V) operation [1] and ultra-low leakage (ULL) SRAM bit-cell (0.1x vs. normal) supporting low sleep mode chip current are applied to extend battery life-time. Stable endurance and high (/low)-temperature retention after cycling stress are achieved by robust split-gate type eFlash cell.