机械加工对氧化铝陶瓷二次电子发射的影响

Suharyanto, S. Michizono, Y. Saito, Tumiran, Y. Yamano, S. Kobayashi
{"title":"机械加工对氧化铝陶瓷二次电子发射的影响","authors":"Suharyanto, S. Michizono, Y. Saito, Tumiran, Y. Yamano, S. Kobayashi","doi":"10.1109/DEIV.2006.357240","DOIUrl":null,"url":null,"abstract":"Secondary electron emission (SEE) coefficients of alumina ceramics with three different surface finishes have been measured using a scanning electron microscope with a single-pulse electron beam (100 pA, 1 ms). SEE coefficients of those aluminas with annealing process became lower after mechanical grinding operations even though its average roughness was almost same as those of as-sintered ones. SEE coefficients of mirror-finished samples were the smallest among the samples. Changes of SEE coefficient with incident angle of primary electrons for smooth and rough surfaces are also discussed","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"88 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Influence of Mechanical Finishing on Secondary Electron Emission of Alumina Ceramics\",\"authors\":\"Suharyanto, S. Michizono, Y. Saito, Tumiran, Y. Yamano, S. Kobayashi\",\"doi\":\"10.1109/DEIV.2006.357240\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Secondary electron emission (SEE) coefficients of alumina ceramics with three different surface finishes have been measured using a scanning electron microscope with a single-pulse electron beam (100 pA, 1 ms). SEE coefficients of those aluminas with annealing process became lower after mechanical grinding operations even though its average roughness was almost same as those of as-sintered ones. SEE coefficients of mirror-finished samples were the smallest among the samples. Changes of SEE coefficient with incident angle of primary electrons for smooth and rough surfaces are also discussed\",\"PeriodicalId\":369861,\"journal\":{\"name\":\"2006 International Symposium on Discharges and Electrical Insulation in Vacuum\",\"volume\":\"88 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 International Symposium on Discharges and Electrical Insulation in Vacuum\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DEIV.2006.357240\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DEIV.2006.357240","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

采用单脉冲电子束(100 pA, 1 ms)扫描电子显微镜测量了三种不同表面处理的氧化铝陶瓷的二次电子发射(SEE)系数。机械磨削处理后,退火氧化铝的平均粗糙度与烧结氧化铝基本相同,但其SEE系数有所降低。镜面加工样品的SEE系数最小。讨论了光滑表面和粗糙表面的SEE系数随一次电子入射角的变化
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Influence of Mechanical Finishing on Secondary Electron Emission of Alumina Ceramics
Secondary electron emission (SEE) coefficients of alumina ceramics with three different surface finishes have been measured using a scanning electron microscope with a single-pulse electron beam (100 pA, 1 ms). SEE coefficients of those aluminas with annealing process became lower after mechanical grinding operations even though its average roughness was almost same as those of as-sintered ones. SEE coefficients of mirror-finished samples were the smallest among the samples. Changes of SEE coefficient with incident angle of primary electrons for smooth and rough surfaces are also discussed
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Plasma CVD for Producing Si Quantum Dot Films Determination of Plasma Current on the Electrode Biased a High Negative Potential Interaction of a Vacuum Arc with an SF6 Arc in a Hybrid Circuit Breaker during High-Current Interruption Improvement on the Property of TiO2 Films due to Plasma Processing Investigation of Plasma Recovery during Fall Time in Plasma Source Ion Implantation
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1