J. Scholvin, David R. Greenberg, Jesus A. del Alamo
{"title":"射频功率应用中深度缩放CMOS的基本功率和频率限制","authors":"J. Scholvin, David R. Greenberg, Jesus A. del Alamo","doi":"10.1109/IEDM.2006.347001","DOIUrl":null,"url":null,"abstract":"This study compares the RF power performance of 65 nm and 0.25 mum CMOS devices integrated on an advanced 65 nm process, and discusses their power and frequency limitations for the first time. The authors demonstrate output power levels of about 80 mW for 65 nm devices, and 450 mW for 0.25 mum devices when operated at their nominal voltages of 1.0 and 2.5 V respectively. The authors find that output power as well as the maximum frequency is limited by parasitic resistances in the backend. The results provide insight into the performance potential of RF power amplifiers integrated into advanced CMOS technologies in SoC applications","PeriodicalId":366359,"journal":{"name":"2006 International Electron Devices Meeting","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"33","resultStr":"{\"title\":\"Fundamental Power and Frequency Limits of Deeply-Scaled CMOS for RF Power Applications\",\"authors\":\"J. Scholvin, David R. Greenberg, Jesus A. del Alamo\",\"doi\":\"10.1109/IEDM.2006.347001\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This study compares the RF power performance of 65 nm and 0.25 mum CMOS devices integrated on an advanced 65 nm process, and discusses their power and frequency limitations for the first time. The authors demonstrate output power levels of about 80 mW for 65 nm devices, and 450 mW for 0.25 mum devices when operated at their nominal voltages of 1.0 and 2.5 V respectively. The authors find that output power as well as the maximum frequency is limited by parasitic resistances in the backend. The results provide insight into the performance potential of RF power amplifiers integrated into advanced CMOS technologies in SoC applications\",\"PeriodicalId\":366359,\"journal\":{\"name\":\"2006 International Electron Devices Meeting\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"33\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2006.347001\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2006.347001","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fundamental Power and Frequency Limits of Deeply-Scaled CMOS for RF Power Applications
This study compares the RF power performance of 65 nm and 0.25 mum CMOS devices integrated on an advanced 65 nm process, and discusses their power and frequency limitations for the first time. The authors demonstrate output power levels of about 80 mW for 65 nm devices, and 450 mW for 0.25 mum devices when operated at their nominal voltages of 1.0 and 2.5 V respectively. The authors find that output power as well as the maximum frequency is limited by parasitic resistances in the backend. The results provide insight into the performance potential of RF power amplifiers integrated into advanced CMOS technologies in SoC applications