化学束外延生长的InP/GaAs/GaP/GaAs短周期超晶格

A. Freundlich, A. Bensaoula, A. Bensaoula, V. Rossignol
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引用次数: 1

摘要

研究了一类新型伪晶应变层超晶格的生长。利用化学束外延技术在GaAs衬底上生长出n=1 ~ 4层和m=4 ~ 40层的InP(n)/GaAs(m)/GaP(n)/GaAs(m)超晶格。实现了n=4层的InP(n)/GaAs(m)/GaP(n)/ GaAs(m)超晶格的应变平衡。50周期In(4)/GaAs(4)/GaP(4)/GaAs(4)超晶格引入的全局失配小于2/spl倍/10/sup -3/,并且在衍射图中清晰地观察到超晶格卫星峰,表明化学束外延非常适合实现这种应变平衡的短超晶格。
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InP/GaAs/GaP/GaAs short period superlattices grown by chemical beam epitaxy
The growth of a new type of pseudomorphically strained layer superlattice is investigated. InP(n)/GaAs(m)/GaP(n)/GaAs(m) superlattices with n=1 to 4 monolayers and m=4 to 40 monolayers were grown using chemical beam epitaxy on GaAs substrates. Perfectly strain balanced InP(n)/GaAs(m)/GaP(n)/ GaAs(m) superlattices with n=4 monolayers were realized. The global mismatch introduced by 50 period In(4)/GaAs(4)/GaP(4)/GaAs(4) superlattices is below 2/spl times/10/sup -3/ and superlattice satellite peaks are clearly observed in the diffraction patterns, demonstrating that chemical beam epitaxy is perfectly suited for realization of such strain balanced short superlattices.<>
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