Sungman Rhee, Hyunjin Kim, Sangku Park, T. Uemura, Yuchul Hwang, S. Choo, Jinju Kim, H. Rhee, Shin-Young Chung
{"title":"基于机器学习的V-ramp VBD预测模型,利用ocd测量晶圆厂参数早期检测MOL可靠性风险","authors":"Sungman Rhee, Hyunjin Kim, Sangku Park, T. Uemura, Yuchul Hwang, S. Choo, Jinju Kim, H. Rhee, Shin-Young Chung","doi":"10.1109/IRPS48203.2023.10117962","DOIUrl":null,"url":null,"abstract":"In this paper, we propose for the first time a breakdown voltage $(\\mathrm{V}_{\\text{BD}})$ prediction method using structural parameters measured in-process for early detection of reliability risks in Middle-Of-Line (MOL). $\\boldsymbol{\\mathrm{V}_{\\text{BD}}}$ of the MOL is proportional to the distance of the Gate (PC) to Source/Drain-Contact (CA). Since PC to CA space can be calculated using MOL-related structural parameters at the early stage of the process, we created and validated models predicting V-ramp $\\boldsymbol{\\mathrm{V}_{\\text{BD}}}$ using five fab parameters measured in-process by optical critical dimension scatterometry (OCD). And we compared three modeling methods. The first is the geometrical calculation model (GCM), the second is multiple-linear-regression (MLR) method, and the last is the Multi-Layer Perceptions (MLP) model based on the machine learning (ML). We found the highest predictive consistency $\\boldsymbol{\\mathrm{R}^{2}0.6}$ in ML method, and it is expected to contribute to the early prediction of MOL V-ramp $\\mathrm{V}_{\\text{BD}}$ through additional consistency improvements.","PeriodicalId":159030,"journal":{"name":"2023 IEEE International Reliability Physics Symposium (IRPS)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Machine Learning Based V-ramp VBD Predictive Model Using OCD-measured Fab Parameters for Early Detection of MOL Reliability Risk\",\"authors\":\"Sungman Rhee, Hyunjin Kim, Sangku Park, T. Uemura, Yuchul Hwang, S. Choo, Jinju Kim, H. Rhee, Shin-Young Chung\",\"doi\":\"10.1109/IRPS48203.2023.10117962\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we propose for the first time a breakdown voltage $(\\\\mathrm{V}_{\\\\text{BD}})$ prediction method using structural parameters measured in-process for early detection of reliability risks in Middle-Of-Line (MOL). $\\\\boldsymbol{\\\\mathrm{V}_{\\\\text{BD}}}$ of the MOL is proportional to the distance of the Gate (PC) to Source/Drain-Contact (CA). Since PC to CA space can be calculated using MOL-related structural parameters at the early stage of the process, we created and validated models predicting V-ramp $\\\\boldsymbol{\\\\mathrm{V}_{\\\\text{BD}}}$ using five fab parameters measured in-process by optical critical dimension scatterometry (OCD). And we compared three modeling methods. The first is the geometrical calculation model (GCM), the second is multiple-linear-regression (MLR) method, and the last is the Multi-Layer Perceptions (MLP) model based on the machine learning (ML). We found the highest predictive consistency $\\\\boldsymbol{\\\\mathrm{R}^{2}0.6}$ in ML method, and it is expected to contribute to the early prediction of MOL V-ramp $\\\\mathrm{V}_{\\\\text{BD}}$ through additional consistency improvements.\",\"PeriodicalId\":159030,\"journal\":{\"name\":\"2023 IEEE International Reliability Physics Symposium (IRPS)\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 IEEE International Reliability Physics Symposium (IRPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS48203.2023.10117962\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE International Reliability Physics Symposium (IRPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS48203.2023.10117962","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Machine Learning Based V-ramp VBD Predictive Model Using OCD-measured Fab Parameters for Early Detection of MOL Reliability Risk
In this paper, we propose for the first time a breakdown voltage $(\mathrm{V}_{\text{BD}})$ prediction method using structural parameters measured in-process for early detection of reliability risks in Middle-Of-Line (MOL). $\boldsymbol{\mathrm{V}_{\text{BD}}}$ of the MOL is proportional to the distance of the Gate (PC) to Source/Drain-Contact (CA). Since PC to CA space can be calculated using MOL-related structural parameters at the early stage of the process, we created and validated models predicting V-ramp $\boldsymbol{\mathrm{V}_{\text{BD}}}$ using five fab parameters measured in-process by optical critical dimension scatterometry (OCD). And we compared three modeling methods. The first is the geometrical calculation model (GCM), the second is multiple-linear-regression (MLR) method, and the last is the Multi-Layer Perceptions (MLP) model based on the machine learning (ML). We found the highest predictive consistency $\boldsymbol{\mathrm{R}^{2}0.6}$ in ML method, and it is expected to contribute to the early prediction of MOL V-ramp $\mathrm{V}_{\text{BD}}$ through additional consistency improvements.