InP基碳掺杂基HBT技术:最新进展及电路应用

J. Song, B.W.-P. Hong, C. Palmstrøm, K.B. Chough
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引用次数: 12

摘要

综述了碳掺杂InP/In/sub 0.53/Ga/sub 0.47/As单、双异质结双极晶体管(SHBT和DHBT)技术的最新进展。化学束外延(CBE)已被用于器件结构的生长。迄今为止,具有两个1.5 /spl mu/m/spl倍/10 /spl mu/m发射指的SHBT,其f/sub T/和f/sub max(MAG/)分别为186 GHz和90 GHz。据我们所知,该器件的f/sub T/是迄今报道的任何类型的双极晶体管中最高的。连续输出功率为0.4 W (3.5 W/mm),功率增加效率为36%。SMBT技术已被应用于宽带放大器的实现。一个简单的直接耦合放大器显示了超过20 GHz的3db带宽。结果表明,碳掺杂碱InP/InGaAs HBTs在高速和微波应用方面具有巨大的潜力。
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InP based carbon-doped base HBT technology: its recent advances and circuit applications
Recent advances of carbon-doped InP/In/sub 0.53/Ga/sub 0.47/As singleand double-heterojunction bipolar transistor (SHBT and DHBT) technology, are reviewed. Chemical beam epitaxy (CBE) has been utilized to grow the device structures. Up to date, the SHBT having two 1.5 /spl mu/m/spl times/10 /spl mu/m emitter fingers has exhibited f/sub T/ and f/sub max(MAG/) of 186 GHz and 90 GHz, respectively. To our knowledge, the f/sub T/ of this device is the highest of any type of bipolar transistors yet reported. CW output power of 0.4 W (3.5 W/mm) with power-added efficiency of 36% has been achieved with the 12-finger DHBTs. The SMBT technology has been applied to realization of wideband amplifiers. A simple directly-coupled amplifier has shown a 3-dB bandwidth of over 20 GHz. The results indicate the great potential of carbon-doped base InP/InGaAs HBTs for high-speed and microwave applications.<>
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Comparisons between conventional LEC, VCZ and VGF for the growth of InP crystals Reliability of InP-based HBT's and HEMT's: experiments, failure mechanisms, and statistics Bulk InP technologies: InP against GaAs Improvement of InAlAs/InP heterointerface grown by MOVPE by using thin AlP layer Low pressure pyrolysis of alternative phosphorous precursors for chemical beam epitaxial growth of InP and related compounds
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