深阱在硅砷化镓光导瞬态中的作用

B. Šantić, U. Desnica, N. Radic, D. Desnica, M Tomislav Pavlovic
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引用次数: 0

摘要

研究了半绝缘(SI)砷化镓在弱光照射下的光导瞬态。最初采用热刺激电流法,将光电导率瞬态与载流子填充深阱的过程联系起来。提出了一个简单的模型来解释观测到的现象。也可以估计优势圈闭的捕获截面。与先前的一些解释相反,EL2或其他缺陷的亚稳性是不被认为的。结果表明,除EL2外,深层能级在低温瞬态现象中起主导作用。该方法和模型可用于其它SI半导体的研究。在附录中,讨论了陷阱浓度大(>N/sub EL2/)的可能性。
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The role of deep traps in photoconductivity transients in SI GaAs
Photoconductivity transients in semi-insulating (SI) GaAs during illumination with low intensity light are studied. By an original usage of thermally stimulated current method, the photoconductivity transient is related to the process of filling of deep traps with charge carriers. A simple model is proposed which explains the observed phenomena. It is also possible to estimate the capture cross section for dominant traps. Contrary to some previous explanations, the metastability of EL2 or other defects is not supposed. It is shown that deep levels, other than EL2, can play the dominant roles in low temperature transient phenomena. Both, the methodology and the model can be used in study of other SI semiconductors. In appendix, the possibility of large concentration of traps ( >N/sub EL2/) is discussed.
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