{"title":"射频mosfet衬底电阻的提取方法","authors":"Jeonghu Han, M. Je, Hyungcheol Shin","doi":"10.1109/ICMTS.2002.1193167","DOIUrl":null,"url":null,"abstract":"This paper proposes a simple and accurate method for extracting substrate resistance of an RF MOSFET from the measured network parameters. The extraction results for 0.18-/spl mu/m MOSFETs are presented for various bias conditions and devices with different geometries.","PeriodicalId":188074,"journal":{"name":"Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002.","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-04-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Extraction method for substrate resistance of RF MOSFETs\",\"authors\":\"Jeonghu Han, M. Je, Hyungcheol Shin\",\"doi\":\"10.1109/ICMTS.2002.1193167\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper proposes a simple and accurate method for extracting substrate resistance of an RF MOSFET from the measured network parameters. The extraction results for 0.18-/spl mu/m MOSFETs are presented for various bias conditions and devices with different geometries.\",\"PeriodicalId\":188074,\"journal\":{\"name\":\"Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002.\",\"volume\":\"45 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-04-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.2002.1193167\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2002.1193167","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Extraction method for substrate resistance of RF MOSFETs
This paper proposes a simple and accurate method for extracting substrate resistance of an RF MOSFET from the measured network parameters. The extraction results for 0.18-/spl mu/m MOSFETs are presented for various bias conditions and devices with different geometries.