在100℃以下加工的高迁移率多晶ZnO透明薄膜晶体管的输运机理

P. B. Pillai, M. M. De Souza
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引用次数: 1

摘要

我们证明了高性能的ZnO tft具有创纪录的场效应迁移率229 cm2/V。s,开/关比超过107(仅受我们简单的器件结构限制)和亚阈值摆幅(s) < 150mv /dec,超过了许多报道的非晶铟镓锌氧化物(a-IGZO)薄膜晶体管的性能。1,2通过二维数值模拟提取的ZnO中态密度(DOS)的尾态分布与实验相匹配,明确地证明了支持所有透明导电氧化物(tco)的相似迁移机制-无论非晶或非晶。ZnO的特征温度为~463 K,态尾态密度(DOS)为~1.3 ×1020cm-3eV-1。
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Transport mechanism in sub 100°C processed high mobility polycrystalline ZnO transparent thin film transistors
We demonstrate high performance ZnO TFTs with record field effect mobility 229 cm2/V.s, on/off ratio exceeding 107 (limited only by our simple device structure) and sub threshold swing (S) <;150 mV/dec, surpassing the performance of many reported amorphous Indium Gallium Zinc Oxide (a-IGZO) thin film transistors.1,2 The tail state distribution of the density of states (DOS) in ZnO extracted via 2D numerical simulations matched to experiment, demonstrates unequivocally a similar mobility mechanism that underpins all Transparent Conducting Oxides (TCOs)-whether amorphous or not. The characteristic Temperature of ZnO is found to be ~463 K and the tail state density of states (DOS) is ~1.3 ×1020cm-3eV-1.
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