低成本,无tsv的单片3D-IC,具有异构集成的逻辑,存储和传感器模拟电路的物联网

Tsung-Ta Wu, C. Shen, J. Shieh, Wen-Hsien Huang, Hsing-Hsiang Wang, F. Hsueh, Hisu-Chih Chen, Chih-Chao Yang, Tung-Ying Hsieh, Bo-Yuan Chen, Y. Shiao, Chao-Shun Yang, G. Huang, Kai-Shin Li, T. Hsueh, Chien-Fu Chen, Wei-Hao Chen, Fu-Liang Yang, Meng-Fan Chang, W. Yeh
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引用次数: 26

摘要

首次开发了CO2远红外激光退火(CO2- fir - la)技术作为激活解决方案,实现了无tsv单片3DIC的高度异质集成,而不会导致器件退化。该工艺能够实现小面积小负载垂直连接器,栅极优先高k/金属栅极mosfet和非al金属互连。这种远红外激光退火具有出色的选择性激活能力,可以实现性能增强的40nm以下utb - mosfet堆叠(离子增强超过50%)。与基于tsv的3D-IC不同,这种3D单片IC可以在层之间实现超宽io连接,以更低的功耗实现高带宽。集成了逻辑电路、6T SRAM、ReRAM、感测放大器、模拟放大器和气体传感器的测试芯片,证实了所提出的CO2-FIR-LA技术在异构集成方面的优势。该芯片展示了上述报道的3D单片集成电路中最可变的功能。该基于CO2-FIR-LA的无tsv 3D单片集成电路可实现物联网低成本、小占地、高异构集成。
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Low-cost and TSV-free monolithic 3D-IC with heterogeneous integration of logic, memory and sensor analogy circuitry for Internet of Things
For the first time, a CO2 far-infrared laser annealing (CO2-FIR-LA) technology was developed as the activation solution to enable highly heterogeneous integration without causing device degradation for TSV-free monolithic 3DIC. This process is capable to implement small-area-small-load vertical connectors, gate-first high-k/metal gate MOSFETs and non-Al metal inter-connects. Such a far-infrared laser annealing exhibits excellent selective activation capability that enables performance-enhanced stacked sub-40nm UTB-MOSFETs (Ion-enhanced over 50 %). Unlike TSV-based 3D-IC, this 3D Monolithic IC enables ultra-wide-IO connections between layers to achieve high bandwidth with less power consumption. A test chip with logic circuits, 6T SRAM, ReRAM, sense amplifiers, analog amplifiers and gas sensors was integrated to confirm the superiority in heterogeneous integration of proposed CO2-FIR-LA technology. This chip demonstrates the most variable functions above reported 3D Monolithic ICs. This CO2-FIR-LA based TSV-free 3D Monolithic IC can realize low cost, small footprint, and highly heterogeneous integration for Internet of Things.
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