低温生长MBE GaAs的电导率和霍尔效应测量

D. Look, G. Robinson, J. Sizelove, C. E. Stutz
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引用次数: 1

摘要

我们对在200-400 /spl°C下生长并在700 /spl°C下退火的MBE GaAs层进行了霍尔效应和电导率测量。这些测量成功的一个关键因素是去除基板。结果包括第一次精确测量迁移率,在退火材料中迁移率可以大于1000 cm/sup 2//V s,并且在E/sub C/ - 0.45 eV附近发现了一个新的致密供体,比该材料中已知的el2样供体浅得多。由于至少存在两个给体和一个受体,以及两种类型的电导率,跳变和能带,因此电学和光学性质的退火行为可能相当复杂。
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Conductivity and Hall-effect measurements on MBE GaAs grown at low temperatures
We have performed Hall-effect and conductivity measurements on MBE GaAs layers grown at 200-400 /spl deg/C, and annealed at temperatures up to 700 /spl deg/C. A key element in the success of these measurements is removal of the substrate. Results include the first accurate measurement of mobility, which can be greater than 1000 cm/sup 2//V s in annealed material, and the discovery of a new, dense donor near E/sub C/ - 0.45 eV, which is much shallower than the well-known EL2-like donor in this material. Annealing behavior of the electrical and optical properties can be quite complicated due to the existence of at least two donors as well as an acceptor, and two types of conductivity, hopping and band.
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