利用改进的光致电流光谱(PICS)表征InP衬底上超亚微米调制掺杂场效应晶体管中的深能级陷阱

R. Sung, M. B. Das
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引用次数: 0

摘要

我们使用先前开发的改进的光感应电流光谱(PICS)技术扫描了基于InP衬底的0.15/spl mu/m x 50/spl mu/m栅极面积MODFET的电子和空穴阱的光学活化能。为了比较,我们还研究了传统AlGaAs/GaAs MODFET中的陷阱。在恒定的低漏极电压(/spl les/ 40mV)下,在有或没有预脉冲的高漏极电压下进行测量,以探索通道和缓冲层中可能存在的陷阱。给出了光学活化能和热活化能的测定结果,以供比较。
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Characterization of deep level traps in ultrasubmicron modulation-doped field-effect transistors on InP substrate using improved photo-induced current spectroscopy (PICS)
We have used a previously developed improved photo induced current spectroscopy (PICS) technique to scan the optical activation energies of electron and hole traps in 0.15/spl mu/m x 50/spl mu/m gate-area MODFET's based on InP substrate. For comparison purposes we have also examined the traps in a conventional AlGaAs/GaAs MODFET. Measurements with a constant low-drain voltage (/spl les/ 40mV), with and without a pre-pulsed higher drain voltage, are performed to explore the possible presence of traps in the channel and buffer layers. Results of determination of optical and thermal activation energies are presented for comparison.
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