{"title":"CMOS晶圆抗KOH的金属膜保护","authors":"U. Munch, O. Brand, O. Paul, H. Baltes, M. Bossel","doi":"10.1109/MEMSYS.2000.838587","DOIUrl":null,"url":null,"abstract":"This paper reports a new protection for the front side of fully processed CMOS wafers against KOH etching solutions. The protection is based on thin TiW and Au films and is fully CMOS compatible. No mechanical fixture is required during the anisotropic etching step. Therefore, the new method is excellently suited for batch micromachining. Up to 100% of all chips on 6 inch wafers were fully operational after 4 hours KOH etching. The membrane yield after KOH etching was 100% and nearly 90% after the not yet optimized removal of the protection films. Thus, this protection fulfils the requirements of inexpensive and reliable sensor production.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"94 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Metal film protection of CMOS wafers against KOH\",\"authors\":\"U. Munch, O. Brand, O. Paul, H. Baltes, M. Bossel\",\"doi\":\"10.1109/MEMSYS.2000.838587\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper reports a new protection for the front side of fully processed CMOS wafers against KOH etching solutions. The protection is based on thin TiW and Au films and is fully CMOS compatible. No mechanical fixture is required during the anisotropic etching step. Therefore, the new method is excellently suited for batch micromachining. Up to 100% of all chips on 6 inch wafers were fully operational after 4 hours KOH etching. The membrane yield after KOH etching was 100% and nearly 90% after the not yet optimized removal of the protection films. Thus, this protection fulfils the requirements of inexpensive and reliable sensor production.\",\"PeriodicalId\":251857,\"journal\":{\"name\":\"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)\",\"volume\":\"94 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-01-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MEMSYS.2000.838587\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMSYS.2000.838587","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
This paper reports a new protection for the front side of fully processed CMOS wafers against KOH etching solutions. The protection is based on thin TiW and Au films and is fully CMOS compatible. No mechanical fixture is required during the anisotropic etching step. Therefore, the new method is excellently suited for batch micromachining. Up to 100% of all chips on 6 inch wafers were fully operational after 4 hours KOH etching. The membrane yield after KOH etching was 100% and nearly 90% after the not yet optimized removal of the protection films. Thus, this protection fulfils the requirements of inexpensive and reliable sensor production.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
