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引用次数: 7

摘要

本文利用微机械差分电容应变传感器研究了不同条件下沉积在硅和玻璃基底上的电镀镍的力学性能。研究了热膨胀系数(/spl α /)、杨氏模量和残余应变随温度的变化规律。在23-150/spl℃范围内测得的a值为8-16 ppm/K;1例残余应变在23-100/spl℃范围内由中性微应变变为-880微应变,另1例在23-130/spl℃范围内由+68.5微应变变为-420微应变;室温下杨氏模量为115 ~ 135 GPa。通过数值模拟评估了该装置对结构非理想性的敏感性。
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Temperature coefficients of material properties for electrodeposited MEMS
This paper presents the use of micromachined differential capacitive strain sensors to investigate mechanical properties of electroplated Ni deposited under two different conditions on Si and glass substrates. The thermal expansion coefficient (/spl alpha/), Young's modulus, and residual strain were studied as a function of temperature. The measured a was 8-16 ppm/K over 23-150/spl deg/C; the residual strain changed from neutral to -880 microstrain over 23-100/spl deg/C in one case and +68.5 microstrain to -420 microstrain over 23-130/spl deg/C in another case; and the Young's modulus ranged from 115-135 GPa at room temperature. The sensitivity of the device to structural non-idealities was evaluated by numerical modeling.
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