产品可靠性在90nm CMOS及以上

A. Turner
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引用次数: 3

摘要

当90nm和45nm CMOS从实验室成熟到生产车间时,产品的可靠性变得更加重要,因为影响微处理器的缺陷密度和降解机制在宏观层面上可能无法观察到足够的数量或量级。有必要了解设计和制造之间的相互作用,因为它涉及到现场可靠性,而不仅仅是测试现场测量和设计模拟。只有在整个产品开发周期中集成可靠性方法,明天的产品才会成功。通过产品的使用寿命了解产品的可靠性和性能指标是必要的。这需要了解最敏感的电路和最有可能对它们产生负面影响的机制。最节省时间的方法是通过加速的生活压力跟踪这些指标,并相应地评估失败
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Product reliability in 90nm CMOS and beyond
While 90nm and 45nm CMOS matures from the lab to the manufacturing floor, the reliability of the product becomes more important as defect densities and degradation mechanisms that affect microprocessors may not be observable in sufficient quantities or magnitude at the macro level. There is a need to understand that the interaction between design and manufacturing, as it relates to field reliability, is moving beyond test-site measurements and design simulation alone. Only via the integration of reliability methodologies throughout the entire product development cycle will tomorrow's products be successful. Understanding the product reliability and performance metrics through the useful life of the product is imperative. This requires knowledge of the most sensitive circuits and the mechanisms that are most likely to negatively affect them. The most time efficient way to do this is by tracking these metrics through an accelerated life stress and evaluating fails accordingly
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