用于下一代器件的具有部分沟槽隔离(PTI)的高软误差容限体系SOI技术

Y. Hirano, T. Iwamatsu, K. Shiga, K. Nii, K. Sonoda, T. Matsumoto, S. Maeda, Y. Yamaguchi, T. Ipposhi, S. Maegawa, Y. Inoue
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引用次数: 8

摘要

实验证明,带部分沟槽隔离(PTI)的体系SOI技术具有显著的高软误差抗扰性。与普通SRAM相比,采用PTI的0.18 /spl mu/m SOI 4mbit SRAM,通过平衡SOI厚度和井阻,成功地将软误差率降低了3个数量级。据估计,由于浮体撞击和漏极撞击都会引起大量电荷收集,导致浮体装置的软误差抗扰度下降。提出了一种抑制软误差的SOI结构设计准则。根据指南,在0.13 /spl mu/m节点以上,与体系SOI器件和浮体SOI器件相比,体系SOI器件预计具有较高的软误差抗免疫力。
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High soft-error tolerance body-tied SOI technology with partial trench isolation (PTI) for next generation devices
It was proven that the body-tied SOI technology with partial trench isolation (PTI) has significant high soft-error immunity. As compared with the bulk, a three-order reduction of the soft-error rate for a 0.18 /spl mu/m SOI 4 Mbit SRAM with the PTI was successfully realized by the balanced combination of the SOI thickness and well resistance. It is estimated that the soft-error immunity for the floating-body device degrades because large charge collection is induced by not only the body strike but also the drain strike. A design guideline of the SOI structure to suppress soft errors is presented. According to the guideline, beyond 0.13 /spl mu/m node, high soft-error immunity for the body-tied SOI device was projected as compared with the bulk as well as the body-floating SOI device.
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