{"title":"频率相关的电荷泵浦,它能探测多深?","authors":"Y. Wang, V. Lee, K. Cheung","doi":"10.1109/IEDM.2006.346898","DOIUrl":null,"url":null,"abstract":"Frequency dependent charge pumping measurement has become an important tool for high-k dielectric reliability investigation. The interpretation of how deep the technique probes has become a controversy with important implication on the reliability of the high-k gate dielectric. The paper examines this problem experimentally and theoretically in this paper. Charge pumping experiment has been carried out to beyond 1GHz for the first time, providing evidence that neither of the existing models is correct. The paper proposes a new theoretical model that is consistent with the new data","PeriodicalId":366359,"journal":{"name":"2006 International Electron Devices Meeting","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"22","resultStr":"{\"title\":\"Frequency Dependent Charge-Pumping, How deep does it probe?\",\"authors\":\"Y. Wang, V. Lee, K. Cheung\",\"doi\":\"10.1109/IEDM.2006.346898\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Frequency dependent charge pumping measurement has become an important tool for high-k dielectric reliability investigation. The interpretation of how deep the technique probes has become a controversy with important implication on the reliability of the high-k gate dielectric. The paper examines this problem experimentally and theoretically in this paper. Charge pumping experiment has been carried out to beyond 1GHz for the first time, providing evidence that neither of the existing models is correct. The paper proposes a new theoretical model that is consistent with the new data\",\"PeriodicalId\":366359,\"journal\":{\"name\":\"2006 International Electron Devices Meeting\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"22\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2006.346898\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2006.346898","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Frequency Dependent Charge-Pumping, How deep does it probe?
Frequency dependent charge pumping measurement has become an important tool for high-k dielectric reliability investigation. The interpretation of how deep the technique probes has become a controversy with important implication on the reliability of the high-k gate dielectric. The paper examines this problem experimentally and theoretically in this paper. Charge pumping experiment has been carried out to beyond 1GHz for the first time, providing evidence that neither of the existing models is correct. The paper proposes a new theoretical model that is consistent with the new data