用于柔性电子器件的非晶Si:H tft阱态与机械可靠性的相关性

M. H. Lee, S. T. Chang, S. Weng, W.H. Liu, K.-J. Chen, K. Ho, M. Liao, J.-J. Huang, G. Hu
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引用次数: 0

摘要

无序的键可以产生陷阱态的重新分配,导致不稳定的电特性,如阈值电压、亚阈值摆动和载流子的迁移率。弱键或断键可能导致陷阱态的重新分布,并导致在塑料衬底上的a-Si:H tft的电特性不稳定。我们得出结论,机械应变下a-Si:H层的DOS是柔性电子发展的基本可靠性问题。
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The correlation between trap states and mechanical reliability of amorphous Si:H TFTs for flexible electronics
The disordered bonds may generate a redistribution of trap states, resulting in unstable electrical characteristics such as threshold voltage, subthreshold swing, and mobility of carriers. The weak or broken bonds may contribute to the redistribution of trap states, and lead to unstable electrical characteristics of the a-Si:H TFTs on plastic substrates. We conclude that the DOS of an a-Si:H layer under mechanical strain is the fundamental reliability issue for the development of flexible electronics.
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