S. Kota, J. Hetrick, Zhe Li, S. Rodgers, T. Krygowski
{"title":"用于MEMS的高性能柔性行程放大系统的合成","authors":"S. Kota, J. Hetrick, Zhe Li, S. Rodgers, T. Krygowski","doi":"10.1109/MEMSYS.2000.838509","DOIUrl":null,"url":null,"abstract":"We have recently designed, fabricated, demonstrated a new class of compliant stroke amplification mechanisms that are exceptionally well suited for MEMS applications. Manufactured in Sandia's advanced 5-level surface micromachining technology known as SUMMiT-V, these computer generated structures provide high work and area efficiency in designs that are highly compatible with the fabrication process. The actual devices display outstanding yield, robustness, endurance, and resistance to surface adhesion effects during the final release process. One device has been driven to a 20-/spl mu/m output displacement at resonance for more than 10/sup 10/ cycles with no apparent fatigue. This paper focuses on the unique methodology employed to design and analyze these compliant stroke amplification systems. The same approach, however, can be used to design many other compliant structures for fabrication in a MEMS technology. Compliance in design leads to creation of jointless, no-assembly, monolithic mechanical device.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"41","resultStr":"{\"title\":\"Synthesizing high-performance compliant stroke amplification systems for MEMS\",\"authors\":\"S. Kota, J. Hetrick, Zhe Li, S. Rodgers, T. Krygowski\",\"doi\":\"10.1109/MEMSYS.2000.838509\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have recently designed, fabricated, demonstrated a new class of compliant stroke amplification mechanisms that are exceptionally well suited for MEMS applications. Manufactured in Sandia's advanced 5-level surface micromachining technology known as SUMMiT-V, these computer generated structures provide high work and area efficiency in designs that are highly compatible with the fabrication process. The actual devices display outstanding yield, robustness, endurance, and resistance to surface adhesion effects during the final release process. One device has been driven to a 20-/spl mu/m output displacement at resonance for more than 10/sup 10/ cycles with no apparent fatigue. This paper focuses on the unique methodology employed to design and analyze these compliant stroke amplification systems. The same approach, however, can be used to design many other compliant structures for fabrication in a MEMS technology. Compliance in design leads to creation of jointless, no-assembly, monolithic mechanical device.\",\"PeriodicalId\":251857,\"journal\":{\"name\":\"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)\",\"volume\":\"29 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-01-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"41\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MEMSYS.2000.838509\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMSYS.2000.838509","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Synthesizing high-performance compliant stroke amplification systems for MEMS
We have recently designed, fabricated, demonstrated a new class of compliant stroke amplification mechanisms that are exceptionally well suited for MEMS applications. Manufactured in Sandia's advanced 5-level surface micromachining technology known as SUMMiT-V, these computer generated structures provide high work and area efficiency in designs that are highly compatible with the fabrication process. The actual devices display outstanding yield, robustness, endurance, and resistance to surface adhesion effects during the final release process. One device has been driven to a 20-/spl mu/m output displacement at resonance for more than 10/sup 10/ cycles with no apparent fatigue. This paper focuses on the unique methodology employed to design and analyze these compliant stroke amplification systems. The same approach, however, can be used to design many other compliant structures for fabrication in a MEMS technology. Compliance in design leads to creation of jointless, no-assembly, monolithic mechanical device.