用V族液体源常压MOCVD制备高质量长波激光器

M. Heimbuch, A. Holmes, M. Mack, S. Denbaars, L. Coldren, J. Bowers
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摘要

利用叔丁基larsin和叔丁基磷化氢在非氢化物金属有机化学气相沉积系统中制备了低阈值的In/sub x/Ga/sub 1-x/As/InP量子阱激光二极管。广域激光二极管的发射速度为1.3 /spl μ m,具有1500 /spl的Aring/ GaInAsP有源区域,在400微米腔长下实现了1.25 kA/cm/sup /的阈值电流密度。发光强度为1.55 /spl mu/m的应变和非应变量子阱已被纳入激光二极管的有源区。晶格匹配的In/sub 0.53/Ga/sub 0.47/As/InP单量子阱激光器在腔长3.5 mm的广域器件上表现出极低的阈值电流密度,为220 A/cm/sup 2/。压缩应变4量子阱器件在3 mm腔长下显示出优异的阈值电流密度为300 A/cm/sup 2/。
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High quality long wavelength lasers grown by atmospheric pressure MOCVD with liquid group V sources
The authors have achieved low threshold In/sub x/Ga/sub 1-x/As/InP quantum well laser diodes, grown in a non-hydride metalorganic chemical vapor deposition system at atmospheric pressure using tertiarybutylarsine and tertiarybutylphosphine. Broad area laser diodes, emitting at 1.3 /spl mu/m, with a 1500 /spl Aring/ GaInAsP active region achieved threshold current densities of 1.25 kA/cm/sup 2/ for 400 micron cavity length. Strained and unstrained quantum wells with luminescence at 1.55 /spl mu/m have been incorporated into the active regions of laser diodes. Lattice matched In/sub 0.53/Ga/sub 0.47/As/InP single quantum well lasers exhibited extremely low threshold current densities of 220 A/cm/sup 2/ for broad area devices 3.5 mm in cavity length. Compressively strained 4 quantum wells devices displayed excellent threshold current densities of 300 A/cm/sup 2/ for 3 mm cavity lengths.<>
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Normal incidence intersubband absorption in InGaAs quantum wells Interdiffusion of InGaAs/InGaAsP quantum wells GaInP/GaAs HBTs for microwave applications First fabrication of continuously graded InGaAsP on GaAs for 0.98/spl mu/m lasers Improved breakdown-speed tradeoff of InP/InGaAs single heterojunction bipolar transistor using a novel p/sup -/-n/sup -/ collector structure
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