Po-Yen Chiu, M. Ker, F. Tsai, Yeong-Jar Chang
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引用次数: 13

摘要

提出了一种新型的超低漏电流电源轨ESD钳位电路,并在65 nm CMOS工艺下进行了验证,该电路在25℃时的漏电流仅为116nA,远小于传统设计的613μA。在HBM和MM的ESD测试中分别可以达到8kV以上和800V以上的ESD稳健性。
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Ultra-low-leakage power-rail ESD clamp circuit in nanoscale low-voltage CMOS process
A new power-rail ESD clamp circuit with ultra-low-leakage design is presented and verified in a 65-nm CMOS process with a leakage current of only 116nA at 25°C, which is much smaller than that (613μA) of traditional design. Moreover, it can achieve ESD robustness of over 8kV in HBM and 800V in MM ESD tests, respectively.
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