{"title":"Ultra-low-leakage power-rail ESD clamp circuit in nanoscale low-voltage CMOS process","authors":"Po-Yen Chiu, M. Ker, F. Tsai, Yeong-Jar Chang","doi":"10.1109/IRPS.2009.5173343","DOIUrl":null,"url":null,"abstract":"A new power-rail ESD clamp circuit with ultra-low-leakage design is presented and verified in a 65-nm CMOS process with a leakage current of only 116nA at 25°C, which is much smaller than that (613μA) of traditional design. Moreover, it can achieve ESD robustness of over 8kV in HBM and 800V in MM ESD tests, respectively.","PeriodicalId":345860,"journal":{"name":"2009 IEEE International Reliability Physics Symposium","volume":"2006 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-04-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"13","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.2009.5173343","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ultra-low-leakage power-rail ESD clamp circuit in nanoscale low-voltage CMOS process
A new power-rail ESD clamp circuit with ultra-low-leakage design is presented and verified in a 65-nm CMOS process with a leakage current of only 116nA at 25°C, which is much smaller than that (613μA) of traditional design. Moreover, it can achieve ESD robustness of over 8kV in HBM and 800V in MM ESD tests, respectively.