侵蚀介质暴露差压传感器与沉积膜

Salim Bouaidat, Gert Friis Eriksen, R. D. Reus, P. E. Andersen, Siebe Bouwstra
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引用次数: 0

摘要

提出了一种适用于恶劣潮湿环境的压阻式差压传感器。传感器设计基于沉积膜,沉积在多晶硅互连和压敏电阻的顶部。从而实现了平坦的膜表面。这使得薄膜保护涂层使用溅射膜,通常有较差的台阶覆盖。以聚硅和溅射非晶硅为膜材料,氧化钽为涂层材料,对这一概念进行了论证。采用多晶硅压敏电阻,获得了11.3 mV/V bar的灵敏度。将溅射非晶硅膜传感器暴露在pH值为11和70/spl℃的腐蚀性介质中20小时,其性能没有变化。
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Aggressive media exposed differential pressure sensor with a deposited membrane
A new piezoresistive differential pressure sensor design for harsh wet environments is presented. The sensor design is based on a deposited membrane, which is deposited on top of polysilicon interconnects and piezoresistors. Flat membrane surfaces are thereby achieved. This enables thin film protective coating using sputtered films, which usually have poor step coverage. The concept is demonstrated using both epipoly silicon and sputtered amorphous silicon as membrane materials and tantalum oxide as coating material. Using polysilicon piezoresistors, a sensitivity of 11.3 mV/V bar was obtained. Exposure of the sensors with sputtered amorphous silicon membranes to aggressive media with pH 11 and 70/spl deg/C for 20 hours did not change their performance.
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