半绝缘LEC GaAs中反向对比吸收成像与光猝灭深度受体中心的关系

S. Tuzemen, M. Brozel
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引用次数: 0

摘要

反向对比成像是一种光猝灭吸收成像技术,被认为是由非常深的受体吸收产生的,电离能约为E/sub g/ - 65 meV,接近4K。在140K以上的温度下,所有的光学行为都消失了。在本文中,我们给出了这些缺陷光猝灭前后轻n型GaAs的霍尔数据,并证明了预测的受体能级存在,并且能级浓度与RC吸收相关。由此导出了830nm吸收的光学截面。
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The correlation of reverse contrast absorption imaging with photoquenchable deep acceptor centres in semi-insulating LEC GaAs
Reverse Contrast imaging is a photo-quenchable, absorption imaging technique, thought to result from absorption by very deep acceptors with an ionisation energy of approximately E/sub g/ - 65 meV near 4K. At temperatures above 140K, all optical behaviour disappears. In this paper we present Hall data on lightly n-type GaAs both before and after photoquenching of these defects and demonstrate that the predicted acceptor level exists and the concentration of the levels correlates with the RC absorption. Optical cross-sections for this absorption at 830 nm are thus derived.
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