{"title":"基于碳纳米管晶体管的综合研究:几何、界面势垒和散射参数的影响","authors":"M. Pourfath, H. Kosina, S. Selberherr","doi":"10.1109/IEDM.2006.346739","DOIUrl":null,"url":null,"abstract":"The performance of carbon nanotube field-effect transistors has been studied based on the non-equilibrium Green's function formalism. The effects of elastic and inelastic scattering and the impact of parameters, such as electron-phonon coupling strength and phonon energy, on the device performance are analyzed. The effect of scaling of the source-gate spacer, drain-gate spacer, and gate length is studied. The results for devices with different barrier heights at the metal-CNT interface are discussed","PeriodicalId":366359,"journal":{"name":"2006 International Electron Devices Meeting","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"A Comprehensive Study of Carbon Nanotube Based Transistors: The Effects of Geometrical, Interface Barrier, and Scattering Parameters\",\"authors\":\"M. Pourfath, H. Kosina, S. Selberherr\",\"doi\":\"10.1109/IEDM.2006.346739\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The performance of carbon nanotube field-effect transistors has been studied based on the non-equilibrium Green's function formalism. The effects of elastic and inelastic scattering and the impact of parameters, such as electron-phonon coupling strength and phonon energy, on the device performance are analyzed. The effect of scaling of the source-gate spacer, drain-gate spacer, and gate length is studied. The results for devices with different barrier heights at the metal-CNT interface are discussed\",\"PeriodicalId\":366359,\"journal\":{\"name\":\"2006 International Electron Devices Meeting\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2006.346739\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2006.346739","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A Comprehensive Study of Carbon Nanotube Based Transistors: The Effects of Geometrical, Interface Barrier, and Scattering Parameters
The performance of carbon nanotube field-effect transistors has been studied based on the non-equilibrium Green's function formalism. The effects of elastic and inelastic scattering and the impact of parameters, such as electron-phonon coupling strength and phonon energy, on the device performance are analyzed. The effect of scaling of the source-gate spacer, drain-gate spacer, and gate length is studied. The results for devices with different barrier heights at the metal-CNT interface are discussed
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