III-V材料位错动态特性与力学行为

K. Sumino, I. Yonenaga
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引用次数: 2

摘要

比较了几种闪锌矿结构的III - V化合物半导体的位错动态特性,重点讨论了GaAs和InP中位错动态特性的差异。杂质对这些材料中位错的动态行为产生了各种各样的影响。同一材料中不同位错类型的位错迁移率和杂质效应有很大差异。不同类型位错之间的这种差异因材料而异。揭示了各种位错的动态特性是如何反映在这些材料的宏观变形特性上的。
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Dynamic characteristics of dislocations and mechanical behaviour of III-V materials
Dynamic characteristics of dislocations in several III - V compound semiconductors with sphalerite structure are compared with each other, especially focusing on the difference between those in GaAs and InP. Impurities give rise to a quite rich variety of effects on dynamic behavior of dislocations in these materials. The dislocation mobilities and the impurity effects are much different among different types of dislocations in the same material. Such differences among different types of dislocations differ from material to material. It is shown how the dynamic characteristics of various types of dislocations are reflected on the characteristics in macroscopic deformation of these materials.
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