利用衬底参数控制砷化镓的Vth

K. Kaminaka, H. Morishita, M. Kiyama, A. Kawasaki, M. Yokogawa, K. Fujita, S. Akai
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引用次数: 0

摘要

我们研究了阈值电压(Vth)随半绝缘衬底电阻率(p)的变化,发现p和Vth之间有很好的相关性。已有文献报道,半绝缘衬底的微观电阻率均匀性(/spl σ /p/p)与Vth均匀性(/spl σ /Vth)有关。我们研究了/spl σ /p/p与半绝缘衬底霍尔迁移率(/spl mu//sub H/)之间的关系。研究发现,较高的/spl μ //sub H/能产生较好的/spl sigma/Vth。这些结果表明,Vth可以通过衬底参数如电阻率和迁移率来控制。
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Vth control in GaAs by substrate parameters
We have investigated the variation of threshold voltage (Vth) with regard to the resistivity (p) of the semi-insulating substrate, and have found that there is a good correlation between p and Vth. It has previously been reported that the uniformity of Vth (/spl sigma/Vth) has a relation to the uniformity of microscopic resistivity (/spl sigma/p/p) of the semi-insulating substrate. We have studied a correlation between /spl sigma/p/p and the Hall mobility of the semi-insulating substrate (/spl mu//sub H/). It has been found that a substrate with a higher /spl mu//sub H/ can produce better /spl sigma/Vth. These results suggest that the Vth can be controlled by substrate parameters such as resistivity and mobility.
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