用于深度缩放器件的超紧凑虚拟源场效应管模型:标准单元库和数字电路的参数提取和验证

Li Yu, O. Mysore, Lan Wei, L. Daniel, D. Antoniadis, I. Elfadel, D. Boning
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引用次数: 5

摘要

在本文中,我们首次验证了标准单元库和大规模数字电路中基于虚拟源(VS)电荷的紧凑模型。只有少量的物理上有意义的参数,VS模型解释了纳米技术中的主要短通道效应。利用一种新颖的直流和瞬态参数提取方法,用一个特性良好的工业40纳米体硅模型的模拟数据验证了该模型。VS模型用于充分表征标准细胞库,其时序比较显示相对于工业设计套件误差小于2.7%。此外,在供应商CAD环境中,采用1001级逆变器链和32位纹波进位加法器作为测试用例,以验证VS模型在大规模数字电路应用中的使用。参数化Vdd扫描表明,VS模型也可以用于低功耗设计方法。最后,运行时比较表明,使用VS模型的结果是大约7.6倍的加速。
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An ultra-compact virtual source FET model for deeply-scaled devices: Parameter extraction and validation for standard cell libraries and digital circuits
In this paper, we present the first validation of the virtual source (VS) charge-based compact model for standard cell libraries and large-scale digital circuits. With only a modest number of physically meaningful parameters, the VS model accounts for the main short-channel effects in nanometer technologies. Using a novel DC and transient parameter extraction methodology, the model is verified with simulated data from a well-characterized, industrial 40-nm bulk silicon model. The VS model is used to fully characterize a standard cell library with timing comparisons showing less than 2.7% error with respect to the industrial design kit. Furthermore, a 1001-stage inverter chain and a 32-bit ripple-carry adder are employed as test cases in a vendor CAD environment to validate the use of the VS model for large-scale digital circuit applications. Parametric Vdd sweeps show that the VS model is also ready for usage in low-power design methodologies. Finally, runtime comparisons have shown that the use of the VS model results in a speedup of about 7.6×.
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