{"title":"无晶圆厂环境下的可靠性框架","authors":"S. Pai, J. Lee, K. Ng, R. Hsiao, K. Su, E.N. Chou","doi":"10.1109/IRPS.2009.5173255","DOIUrl":null,"url":null,"abstract":"A collaborative framework is presented to address the reliability challenges faced in a fabless-foundry environment. Examples are given to show the effectiveness of this framework for both infant mortality and long-term reliability risk. Through design-for-reliability, optimum process standardization and selective customization, defect density reduction and electrical screening, reliability of the highest level has been achieved in FPGA devices suitable for enterprise, automotive and aerospace applications, all in a fabless-foundry environment.","PeriodicalId":345860,"journal":{"name":"2009 IEEE International Reliability Physics Symposium","volume":"109 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-04-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Reliability framework in a fabless-foundry environment\",\"authors\":\"S. Pai, J. Lee, K. Ng, R. Hsiao, K. Su, E.N. Chou\",\"doi\":\"10.1109/IRPS.2009.5173255\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A collaborative framework is presented to address the reliability challenges faced in a fabless-foundry environment. Examples are given to show the effectiveness of this framework for both infant mortality and long-term reliability risk. Through design-for-reliability, optimum process standardization and selective customization, defect density reduction and electrical screening, reliability of the highest level has been achieved in FPGA devices suitable for enterprise, automotive and aerospace applications, all in a fabless-foundry environment.\",\"PeriodicalId\":345860,\"journal\":{\"name\":\"2009 IEEE International Reliability Physics Symposium\",\"volume\":\"109 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-04-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 IEEE International Reliability Physics Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS.2009.5173255\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.2009.5173255","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Reliability framework in a fabless-foundry environment
A collaborative framework is presented to address the reliability challenges faced in a fabless-foundry environment. Examples are given to show the effectiveness of this framework for both infant mortality and long-term reliability risk. Through design-for-reliability, optimum process standardization and selective customization, defect density reduction and electrical screening, reliability of the highest level has been achieved in FPGA devices suitable for enterprise, automotive and aerospace applications, all in a fabless-foundry environment.