单晶硅(SCS)微镜阵列采用深硅蚀刻和红外对准

Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308) Pub Date : 2000-01-23 DOI:10.1109/MEMSYS.2000.838558

C.S.B. Lee, R. Webb, J. M. Chong, N. MacDonald

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引用次数: 7

摘要

已经设计、制造和测试了10/spl倍/10和5/spl倍/5、高镜面填充系数(>70%)、低电压工作(<30 V)、单晶硅(SCS)微镜阵列。每个镜像是320 /spl mu/m × 170 /spl mu/m，可以单独寻址。与薄膜微反射镜阵列相比，SCS反射镜表面光学平坦光滑，无残余应力，并且在沉积薄铝层后具有高反射率。除了平面反射镜外，还在反射镜表面制作了高纵横比光栅结构，增强了器件的光学操纵潜力。

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Single crystal silicon (SCS) micromirror arrays using deep silicon etching and IR alignment

10/spl times/10 and 5/spl times/5, a high mirror fill factor (>70%), low voltage operation (<30 V), single crystal silicon (SCS) micromirror arrays have been designed, fabricated, and tested. Each mirror is 320 /spl mu/m by 170 /spl mu/m and is individually addressable. In comparison to thin film micro-mirror arrays, the SCS mirror surface is optically flat and smooth, free of residual stress, and highly reflective after the deposition of a thin aluminum layer. In addition to a flat mirror, high-aspect-ratio grating structures have been fabricated on the surface of the mirrors, enhancing the optical manipulation potential of devices.

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Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)

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