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{"title":"第13届IEEE/SEMI先进半导体制造年会。推进半导体制造科学技术。ASMC 2002 (Cat。No.02CH37259)","authors":"","doi":"10.1109/ASMC.2002.1001562","DOIUrl":null,"url":null,"abstract":"The following topics are dealt with: advanced FEOL processing; fab dynamics; yield enhancement tools and methods; process control methodology; resource productivity management; yield modeling, analysis and enhancement; defect-free manufacturing; contamination-free manufacturing; cost management methodologies; advanced BEOL processing; advanced metrology.","PeriodicalId":64779,"journal":{"name":"半导体技术","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2002-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259)\",\"authors\":\"\",\"doi\":\"10.1109/ASMC.2002.1001562\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The following topics are dealt with: advanced FEOL processing; fab dynamics; yield enhancement tools and methods; process control methodology; resource productivity management; yield modeling, analysis and enhancement; defect-free manufacturing; contamination-free manufacturing; cost management methodologies; advanced BEOL processing; advanced metrology.\",\"PeriodicalId\":64779,\"journal\":{\"name\":\"半导体技术\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"半导体技术\",\"FirstCategoryId\":\"1087\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2002.1001562\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"半导体技术","FirstCategoryId":"1087","ListUrlMain":"https://doi.org/10.1109/ASMC.2002.1001562","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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