RF- cmos器件温度相关射频性能的实验研究

S.M. Nam, B. Lee, S. Hong, C.G. Yu, J. Park, H. Yu
{"title":"RF- cmos器件温度相关射频性能的实验研究","authors":"S.M. Nam, B. Lee, S. Hong, C.G. Yu, J. Park, H. Yu","doi":"10.1109/ICVC.1999.820865","DOIUrl":null,"url":null,"abstract":"This paper presents the degradation of f/sub T/ and f/sub max/ in CMOS devices at elevated temperature. Since MOS transistors in RF applications are usually in saturation region and f/sub T/ of CMOS devices is proportional to g/sub m/, a simple empirical model for temperature dependence of g/sub m/ at any measurement bias has been suggested by considering the temperature dependence of carrier mobility and a saturation velocity simultaneously. From the empirical temperature behavior of g/sub m/, we can predict the enhanced RF performances of CMOS at low temperature.","PeriodicalId":13415,"journal":{"name":"ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361)","volume":"84 1","pages":"174-177"},"PeriodicalIF":0.0000,"publicationDate":"1999-10-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Experimental investigation of temperature dependent RF performances of RF-CMOS devices\",\"authors\":\"S.M. Nam, B. Lee, S. Hong, C.G. Yu, J. Park, H. Yu\",\"doi\":\"10.1109/ICVC.1999.820865\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents the degradation of f/sub T/ and f/sub max/ in CMOS devices at elevated temperature. Since MOS transistors in RF applications are usually in saturation region and f/sub T/ of CMOS devices is proportional to g/sub m/, a simple empirical model for temperature dependence of g/sub m/ at any measurement bias has been suggested by considering the temperature dependence of carrier mobility and a saturation velocity simultaneously. From the empirical temperature behavior of g/sub m/, we can predict the enhanced RF performances of CMOS at low temperature.\",\"PeriodicalId\":13415,\"journal\":{\"name\":\"ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361)\",\"volume\":\"84 1\",\"pages\":\"174-177\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-10-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICVC.1999.820865\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICVC.1999.820865","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

本文介绍了CMOS器件在高温下f/sub T/和f/sub max/的衰减。由于射频应用中的MOS晶体管通常处于饱和区,而CMOS器件的f/sub T/与g/sub m/成正比,因此通过同时考虑载流子迁移率和饱和速度的温度依赖性,提出了在任何测量偏置下g/sub m/温度依赖性的简单经验模型。根据g/sub / m/的经验温度行为,我们可以预测CMOS在低温下射频性能的增强。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Experimental investigation of temperature dependent RF performances of RF-CMOS devices
This paper presents the degradation of f/sub T/ and f/sub max/ in CMOS devices at elevated temperature. Since MOS transistors in RF applications are usually in saturation region and f/sub T/ of CMOS devices is proportional to g/sub m/, a simple empirical model for temperature dependence of g/sub m/ at any measurement bias has been suggested by considering the temperature dependence of carrier mobility and a saturation velocity simultaneously. From the empirical temperature behavior of g/sub m/, we can predict the enhanced RF performances of CMOS at low temperature.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Plasma induced charging damage on thin gate oxide A 1.25-GBaud CMOS transceiver with on-chip terminator and voltage mode driver for Gigabit Ethernet 1000Base-X A sense amplifier-based CMOS flip-flop with an enhanced output transition time for high-performance microprocessors Comparison of the characteristics of tunneling oxide and tunneling ON for p-channel nano-crystal memory Double precharge TSPC for high-speed dual-modulus prescaler
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1