负电容CMOS场效应晶体管的非迟滞陡摆幅和缺陷钝化多域开关

Chien Liu, Hsuan-Han Chen, Chih-Chieh Hsu, C. Fan, H. Hsu, Chun‐Hu Cheng
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引用次数: 8

摘要

我们证明了基于缺陷钝化多域开关的2.5nm厚HfAIOx n型NCFET可以实现最小9 mV/dec亚阈值摆幅$(SS)$,可忽略的迟滞为1mV,超低$I_{off}$为135\ \text{fA}/\mu \text{m}$,大$I_{on}/ $I_{0ff}$的比值为8.7\ \乘以10^{7}$,SS在50年内低于60 mV/dec。对于p型NCFET,在栅应力、缺陷钝化和掺杂工程的协同作用下,仍可实现无滞后的陡坡开关。Al掺杂和缺陷钝化对减少陷阱相关泄漏、提高NC和稳定多畴开关起着关键作用。高尺寸HfAIOx CMOS NCFET显示出低功耗逻辑应用的潜力。
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Negative Capacitance CMOS Field-Effect Transistors with Non-Hysteretic Steep Sub-60mV/dec Swing and Defect-Passivated Multidomain Switching
We demonstrated that the 2.5nm-thick HfAIOx N-type NCFET based on defect-passivated multidomain switching can achieve a minimum 9 mV/dec subthreshold swing $(SS)$, a negligible hysteresis of 1mV, an ultralow $I_{off}$ of $135\ \text{fA}/\mu \text{m}$, a large $I_{on}/I_{0ff}$ ratio of $8.7\times 10^{7}$ and a sub-60 mV/dec SS over 5 decade. For P-type NCFET, the non-hysteretic steep-slope switch is still reached under the synergistic effect of gate stress, defect passivation and doping engineering. The Al doping and defect passivation play the key role for reducing trap-related leakage, enhancing NC, and stabilizing multidomain switching. The highly scaled HfAIOx CMOS NCFET shows the potential for low power logic applications.
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