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2011 24th International Vacuum Nanoelectronics Conference最新文献

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Electron emission Si-based resonant-tunneling diode 电子发射硅基谐振隧道二极管
Pub Date : 2011-07-18 DOI: 10.1116/1.3693977
A. Evtukh, N. Goncharuk, V. Litovchenko, H. Mimura
New type of field emission resonant tunneling diode has been proposed and investigated as theoretically and experimentally. It based on Si-SiOx-Si multilayer cathode containing SiOx layer as input potential barrier, Si layer as quantum well and vacuum layer as output potential barrier of double barrier quantum structure. The calculation predicted the existence of the resonant maxima (three or four in dependence of input barrier height) on the current density - electric field dependences. Frequency dependences pointed out on appearance of negative conductance resulted from resonant tunnelling through the second energy level in QW at a series of transit angle (θup) values. The maximal values of optimal and upper frequency about 1.5 THz and 2 THz are reached at θup close to 0.45π when resonant tunnelling occurs through the third resonant level in QW. Experimental results confirmed the existence of the resonance peak in investigated resonant-tunnelling structure.
提出了一种新型场发射谐振隧道二极管,并对其进行了理论和实验研究。它基于Si-SiOx-Si多层阴极,其中SiOx层作为输入势垒,Si层作为量子阱,真空层作为双势垒量子结构的输出势垒。计算预测谐振最大值(与输入势垒高度的关系为3或4)与电流密度-电场相关。指出了在一系列传输角(θup)值下,通过量子阱中第二能级的共振隧穿所导致的负电导的出现与频率有关。当QW通过第三共振能级发生共振隧穿时,在θ ~ 0.45π处达到1.5 THz和2 THz左右的最佳频率和最高频率的最大值。实验结果证实了共振隧穿结构中共振峰的存在。
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引用次数: 13
Work function measurement of Nd-oxide/W(100) surface by using of photoemission electron microscope 利用光电电子显微镜测量Nd-oxide/W(100)表面的功函数
Pub Date : 1900-01-01 DOI: 10.1109/ivnc.2015.7225550
H. Nakane, T. Kitaguchi, T. Kawakubo
A cathode material of a low work function is needed to achieve a high performance electron source. We measured the work function of W(100) surface modified with Nd2O3 by using of photoemission electron microscope. The work function of Nd-oxide/W(100) surface is measured to be 2.5eV.
为了实现高性能的电子源,需要一种低功函数的正极材料。利用光电子显微镜测量了Nd2O3修饰W(100)表面的功函数。测得Nd-oxide的功函数为2.5eV /W(100)。
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引用次数: 0
期刊
2011 24th International Vacuum Nanoelectronics Conference
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