D. Cocco, G. Dakovski, S. Guillet, C. Hardin, D. Morton, J. Nicolas, F. O'Dowd, D. Rich, J. Stieber, Randy A. Whitney
{"title":"The transform limited SXR monochromator with ultra-high-resolution option to open up new scientific capabilities at LCLS II (Conference Presentation)","authors":"D. Cocco, G. Dakovski, S. Guillet, C. Hardin, D. Morton, J. Nicolas, F. O'Dowd, D. Rich, J. Stieber, Randy A. Whitney","doi":"10.1117/12.2322941","DOIUrl":"https://doi.org/10.1117/12.2322941","url":null,"abstract":"","PeriodicalId":296501,"journal":{"name":"Adaptive X-Ray Optics V","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114233864","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
C. Hardin, M. L. Ng, D. Morton, L. Lee, L. Zhang, D. Cocco
With the onset of high power XFELs and diffraction limited storage rings, there is a growing demand to maintain sub nanometer mirror figures even under high heat load. This is a difficult issue as the optimum cooling design for an optic is highly dependent on the power footprint on the mirror, which can be highly dynamic. Resistive Element Adjustable Length (REAL) cooling can be utilized to change the cooling parameters during an experiment to adapt for changing beam parameters. A case study of the new soft x-ray monochromator for the LCLS L2SI program is presented that utilizes this new capability to allow the beam to translate across the mirror for different operation modes, greatly simplifying the monochromator mechanics. Metrology of a prototype mirror will also be presented.
{"title":"Shaping the mirror profile by using a novel cooling scheme to increase optical design flexibility in high power XFELs (Conference Presentation)","authors":"C. Hardin, M. L. Ng, D. Morton, L. Lee, L. Zhang, D. Cocco","doi":"10.1117/12.2323216","DOIUrl":"https://doi.org/10.1117/12.2323216","url":null,"abstract":"With the onset of high power XFELs and diffraction limited storage rings, there is a growing demand to maintain sub nanometer mirror figures even under high heat load. This is a difficult issue as the optimum cooling design for an optic is highly dependent on the power footprint on the mirror, which can be highly dynamic. Resistive Element Adjustable Length (REAL) cooling can be utilized to change the cooling parameters during an experiment to adapt for changing beam parameters. A case study of the new soft x-ray monochromator for the LCLS L2SI program is presented that utilizes this new capability to allow the beam to translate across the mirror for different operation modes, greatly simplifying the monochromator mechanics. Metrology of a prototype mirror will also be presented.","PeriodicalId":296501,"journal":{"name":"Adaptive X-Ray Optics V","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133756773","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
P. Zeitoun, Hélène Couderc-Alteirac, A. L’Huillier, P. Rudawski, H. Dacasa
{"title":"Micro-focusing of broadband high-order harmonic radiation by a double toroidal mirror (Conference Presentation)","authors":"P. Zeitoun, Hélène Couderc-Alteirac, A. L’Huillier, P. Rudawski, H. Dacasa","doi":"10.1117/12.2323770","DOIUrl":"https://doi.org/10.1117/12.2323770","url":null,"abstract":"","PeriodicalId":296501,"journal":{"name":"Adaptive X-Ray Optics V","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129039386","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
P. Zeitoun, Domenico Alj, H. Dacasa, O. Rochefoucauld
With the progresses achieved on the development of high quality, highly coherent soft X-ray (or EUV) sources from synchrotrons, free-electrons laser, high harmonics and plasma based soft X-ray laser, as well as for the need of always better optics for imaging (EUV lithography, EUV spatial telescopes, EUV microscopes), the demand on metrology is increasing very fast. Nowadays, many synchrotrons have developed metrology beamlines but with the limit of being too expensive and too large for transposing them to university-scale laboratories or optical firms. At Laboratoire d'Optique Appliquee, we have developed a compact and versatile metrology beamline to test at-wavelength different EUV optics, from single component to full assembly and adaptive optics. The beamline is based on the use of high harmonics generated by the interaction of a 35 fs, 4 kHz, 3 mJ laser with neutral gases. The high harmonics span from 10 to 50 nm and are fully coherent, collimated and exhibit a good wavefront of about lambda/5 rms. The beamline covers a footprint of about 5*1.5 m2 while the driving laser occupies about 4 m2. Itis composed of an interaction chamber where high harmonics are generated, a spectrometer and the metrology chamber (1.5m*0.7m) . We have tested many optical components from flat or curved mirrors to toroidal mirror or Schwarzschild microscope. We will present in detail the beamline as well as results from optic metrology. The beamline is also used for calibration of wavefront sensors. This beamline is well suited for testing EUV adaptive optic in any configurations.
{"title":"Compact metrology beamline for EUV optic and adaptive optic tests (Conference Presentation)","authors":"P. Zeitoun, Domenico Alj, H. Dacasa, O. Rochefoucauld","doi":"10.1117/12.2323768","DOIUrl":"https://doi.org/10.1117/12.2323768","url":null,"abstract":"With the progresses achieved on the development of high quality, highly coherent soft X-ray (or EUV) sources from synchrotrons, free-electrons laser, high harmonics and plasma based soft X-ray laser, as well as for the need of always better optics for imaging (EUV lithography, EUV spatial telescopes, EUV microscopes), the demand on metrology is increasing very fast. Nowadays, many synchrotrons have developed metrology beamlines but with the limit of being too expensive and too large for transposing them to university-scale laboratories or optical firms. At Laboratoire d'Optique Appliquee, we have developed a compact and versatile metrology beamline to test at-wavelength different EUV optics, from single component to full assembly and adaptive optics. \u0000\u0000The beamline is based on the use of high harmonics generated by the interaction of a 35 fs, 4 kHz, 3 mJ laser with neutral gases. The high harmonics span from 10 to 50 nm and are fully coherent, collimated and exhibit a good wavefront of about lambda/5 rms. \u0000\u0000The beamline covers a footprint of about 5*1.5 m2 while the driving laser occupies about 4 m2. Itis composed of an interaction chamber where high harmonics are generated, a spectrometer and the metrology chamber (1.5m*0.7m) . \u0000\u0000We have tested many optical components from flat or curved mirrors to toroidal mirror or Schwarzschild microscope. We will present in detail the beamline as well as results from optic metrology. The beamline is also used for calibration of wavefront sensors. \u0000\u0000This beamline is well suited for testing EUV adaptive optic in any configurations.","PeriodicalId":296501,"journal":{"name":"Adaptive X-Ray Optics V","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122559470","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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