首页 > 最新文献

Contamination-Free Manufacturing for Semiconductors and Other Precision Products最新文献

英文 中文
Particulate Deposition in Liquid Systems 液体系统中的微粒沉积
Pub Date : 2018-10-08 DOI: 10.1201/9781315214481-13
{"title":"Particulate Deposition in Liquid Systems","authors":"","doi":"10.1201/9781315214481-13","DOIUrl":"https://doi.org/10.1201/9781315214481-13","url":null,"abstract":"","PeriodicalId":325915,"journal":{"name":"Contamination-Free Manufacturing for Semiconductors and Other Precision Products","volume":"116 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124257402","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
On-Wafer Measurement of Molecular Contaminants 分子污染物的晶片测量
Pub Date : 2018-10-08 DOI: 10.1201/9781315214481-11
V. Chia, M. Edgell
{"title":"On-Wafer Measurement of Molecular Contaminants","authors":"V. Chia, M. Edgell","doi":"10.1201/9781315214481-11","DOIUrl":"https://doi.org/10.1201/9781315214481-11","url":null,"abstract":"","PeriodicalId":325915,"journal":{"name":"Contamination-Free Manufacturing for Semiconductors and Other Precision Products","volume":"38 3","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131686575","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Deposition of Metallic Contaminants from Liquids and Their Removal 液体中金属污染物的沉积及其去除
Pub Date : 2018-10-08 DOI: 10.1201/9781315214481-16
R. Donovan
{"title":"Deposition of Metallic Contaminants from Liquids and Their Removal","authors":"R. Donovan","doi":"10.1201/9781315214481-16","DOIUrl":"https://doi.org/10.1201/9781315214481-16","url":null,"abstract":"","PeriodicalId":325915,"journal":{"name":"Contamination-Free Manufacturing for Semiconductors and Other Precision Products","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115154943","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Off-Wafer Measurement of Contaminants 厂外污染物测量
{"title":"Off-Wafer Measurement of Contaminants","authors":"","doi":"10.1201/9781315214481-9","DOIUrl":"https://doi.org/10.1201/9781315214481-9","url":null,"abstract":"","PeriodicalId":325915,"journal":{"name":"Contamination-Free Manufacturing for Semiconductors and Other Precision Products","volume":"14 4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129404621","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Transport and Deposition of Aerosol Particles 气溶胶粒子的输送和沉积
Pub Date : 2018-10-08 DOI: 10.1016/B978-081551555-5.50005-8
D. Rader, A. S. Geller
{"title":"Transport and Deposition of Aerosol Particles","authors":"D. Rader, A. S. Geller","doi":"10.1016/B978-081551555-5.50005-8","DOIUrl":"https://doi.org/10.1016/B978-081551555-5.50005-8","url":null,"abstract":"","PeriodicalId":325915,"journal":{"name":"Contamination-Free Manufacturing for Semiconductors and Other Precision Products","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114379759","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Organic Contamination Removal 去除有机污染
Pub Date : 2018-10-08 DOI: 10.1201/9781315214481-15
{"title":"Organic Contamination Removal","authors":"","doi":"10.1201/9781315214481-15","DOIUrl":"https://doi.org/10.1201/9781315214481-15","url":null,"abstract":"","PeriodicalId":325915,"journal":{"name":"Contamination-Free Manufacturing for Semiconductors and Other Precision Products","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130339894","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
On-Wafer Measurement of Particles 颗粒的片上测量
Pub Date : 2018-10-08 DOI: 10.1201/9781315214481-10
R. Diaz, B. M. Nebeker, E. Hirleman
{"title":"On-Wafer Measurement of Particles","authors":"R. Diaz, B. M. Nebeker, E. Hirleman","doi":"10.1201/9781315214481-10","DOIUrl":"https://doi.org/10.1201/9781315214481-10","url":null,"abstract":"","PeriodicalId":325915,"journal":{"name":"Contamination-Free Manufacturing for Semiconductors and Other Precision Products","volume":"269 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123050459","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
National Technology Roadmap for Semiconductors: Basis and Alignment 国家半导体技术路线图:基础与校准
{"title":"National Technology Roadmap for Semiconductors: Basis and Alignment","authors":"","doi":"10.1201/9781315214481-8","DOIUrl":"https://doi.org/10.1201/9781315214481-8","url":null,"abstract":"","PeriodicalId":325915,"journal":{"name":"Contamination-Free Manufacturing for Semiconductors and Other Precision Products","volume":"50 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132222510","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Sources of Contamination and Their Control 污染源及其控制
Pub Date : 2018-10-08 DOI: 10.1201/9781315214481-17
{"title":"Sources of Contamination and Their Control","authors":"","doi":"10.1201/9781315214481-17","DOIUrl":"https://doi.org/10.1201/9781315214481-17","url":null,"abstract":"","PeriodicalId":325915,"journal":{"name":"Contamination-Free Manufacturing for Semiconductors and Other Precision Products","volume":"109 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125874491","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Deposition of Molecular Contaminants in Gaseous Environments 分子污染物在气体环境中的沉积
Pub Date : 2018-10-08 DOI: 10.1201/9781315214481-14
R. Donovan
{"title":"Deposition of Molecular Contaminants in Gaseous Environments","authors":"R. Donovan","doi":"10.1201/9781315214481-14","DOIUrl":"https://doi.org/10.1201/9781315214481-14","url":null,"abstract":"","PeriodicalId":325915,"journal":{"name":"Contamination-Free Manufacturing for Semiconductors and Other Precision Products","volume":"46 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124421554","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Contamination-Free Manufacturing for Semiconductors and Other Precision Products
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1