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Journal of Micro/Nanopatterning, Materials, and Metrology最新文献

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Thoughts on Photomask Japan 关于日本光罩的想法
Pub Date : 2024-06-11 DOI: 10.1117/1.jmm.23.2.020101
Harry Levinson
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引用次数: 0
Universal approach for process optimization of chemically amplified photoresists in electron beam lithography 电子束光刻技术中化学放大光刻胶工艺优化的通用方法
Pub Date : 2024-05-20 DOI: 10.1117/1.jmm.23.2.024601
Markus Greul, Astrit Shoshi, Jan Klikovits, Stephan Martens, Ulrich Hofmann, Olga Barahona, Benyamin Shnirman, Leon Starz, Patrick Wintrich, Holger Sailer
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引用次数: 0
Pushing the boundaries of patterning: a conversation with Tatiana Kovalevich 突破图案设计的界限:与塔蒂亚娜-科瓦列维奇的对话
Pub Date : 2024-04-03 DOI: 10.1117/1.jmm.23.2.020701
Harry Levinson
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引用次数: 0
Curvilinear data representation and its impact on file size and lithographic performance 曲线数据表示及其对文件大小和光刻性能的影响
Pub Date : 2024-01-30 DOI: 10.1117/1.jmm.23.1.011204
Jiuning Hu, Adam Lyons, Chris Spence, Kurt Wampler, Mahmoud Mohsen, Yen-Wen Lu, Rachit Gupta, Youping Zhang, Rafael Howell, Jiyoon Chang, James Moon, Jun Ye
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引用次数: 0
SwinT-ILT: Swin Transformer embedding end-to-end mask optimization model SwinT-ILT:Swin 变换器嵌入端到端掩码优化模型
Pub Date : 2024-01-30 DOI: 10.1117/1.jmm.23.1.013201
Hui Xu, Pan Qi, Fuxin Tang, Ru-Ru Ma, Huaguo Liang, Zhengfeng Huang, Xiaoqing Wen
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引用次数: 0
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Journal of Micro/Nanopatterning, Materials, and Metrology
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