Pub Date : 2018-01-01DOI: 10.1109/XNANO.2015.2469312
Zuhal Tasdemir;Oliver Peric;Davide Sacchetto;Georg Ernest Fantner;Yusuf Leblebici;B. Erdem Alaca
A monolithic process is developed for the fabrication of Si nanowires within thick Si substrates. A combination of anisotropic etch and sidewall passivation is utilized to protect and release Si lines during the subsequent deep etch. An etch depth of 10 μm is demonstrated with a future prospect for 50 μm opening up new possibilities for the deterministic integration of nanowires with microsystems. Nanowires with in-plane dimensions as low as 20 nm and aspect ratios up to 150 are obtained. Nanomechanical characterization through bending tests further confirms structural integrity of the connection between nanowires and anchoring Si microstructures.
{"title":"Monolithic Fabrication of Silicon Nanowires Bridging Thick Silicon Structures","authors":"Zuhal Tasdemir;Oliver Peric;Davide Sacchetto;Georg Ernest Fantner;Yusuf Leblebici;B. Erdem Alaca","doi":"10.1109/XNANO.2015.2469312","DOIUrl":"https://doi.org/10.1109/XNANO.2015.2469312","url":null,"abstract":"A monolithic process is developed for the fabrication of Si nanowires within thick Si substrates. A combination of anisotropic etch and sidewall passivation is utilized to protect and release Si lines during the subsequent deep etch. An etch depth of 10 μm is demonstrated with a future prospect for 50 μm opening up new possibilities for the deterministic integration of nanowires with microsystems. Nanowires with in-plane dimensions as low as 20 nm and aspect ratios up to 150 are obtained. Nanomechanical characterization through bending tests further confirms structural integrity of the connection between nanowires and anchoring Si microstructures.","PeriodicalId":100627,"journal":{"name":"IEEE Nanotechnology Express","volume":"1 ","pages":"1299-1302"},"PeriodicalIF":0.0,"publicationDate":"2018-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/XNANO.2015.2469312","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"49974449","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2015-12-01DOI: 10.1109/XNANO.2015.2499547
Wolfgang Porod;Adekunle Adeyeye;Neal Anderson;Franz Kreupl;Yoshiaki Nakano;Luca Pierantoni;Dong Sung;Dana Weinstein
The IEEE NANOTECHNOLOGY EXPRESS (ENANO) publishes novel and important results in engineering at the nanoscale. ENANO is dedicated to the rapid publication of Research Letters, published as a web-only, fully open-access (OA) topical journal on topics of great current interest. The scope of ENANO covers all areas of nano- technology, including nanoscale materials, devices, systems, and applications, and their underlying science. ENANO is an interdisciplinary archival journal that is refereed to the archival standards used by other IEEE transactions-level journals.
{"title":"Welcome to the New IEEE Nanotechnology Express (ENANO)!","authors":"Wolfgang Porod;Adekunle Adeyeye;Neal Anderson;Franz Kreupl;Yoshiaki Nakano;Luca Pierantoni;Dong Sung;Dana Weinstein","doi":"10.1109/XNANO.2015.2499547","DOIUrl":"https://doi.org/10.1109/XNANO.2015.2499547","url":null,"abstract":"The IEEE NANOTECHNOLOGY EXPRESS (ENANO) publishes novel and important results in engineering at the nanoscale. ENANO is dedicated to the rapid publication of Research Letters, published as a web-only, fully open-access (OA) topical journal on topics of great current interest. The scope of ENANO covers all areas of nano- technology, including nanoscale materials, devices, systems, and applications, and their underlying science. ENANO is an interdisciplinary archival journal that is refereed to the archival standards used by other IEEE transactions-level journals.","PeriodicalId":100627,"journal":{"name":"IEEE Nanotechnology Express","volume":"1 ","pages":"1-1"},"PeriodicalIF":0.0,"publicationDate":"2015-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/XNANO.2015.2499547","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"49974451","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2015-04-20DOI: 10.1109/XNANO.2015.2422011
These instructions give guidelines for preparing papers for this publication. Presents information for authors publishing in this journal.
这些说明为编写本出版物的论文提供了指导。为在本期刊上发表文章的作者提供信息。
{"title":"IEEE Nanotechnology Express information for authors","authors":"","doi":"10.1109/XNANO.2015.2422011","DOIUrl":"https://doi.org/10.1109/XNANO.2015.2422011","url":null,"abstract":"These instructions give guidelines for preparing papers for this publication. Presents information for authors publishing in this journal.","PeriodicalId":100627,"journal":{"name":"IEEE Nanotechnology Express","volume":"1 ","pages":"C3-C3"},"PeriodicalIF":0.0,"publicationDate":"2015-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/XNANO.2015.2422011","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"49974450","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2015-01-01DOI: 10.1109/XNANO.2016.2524058
Provides a listing of the editors, board members, and current staff for this issue of the publication.
提供本期出版物的编辑、董事会成员和现任员工的列表。
{"title":"IEEE Transactions on Nanotechnology publication information","authors":"","doi":"10.1109/XNANO.2016.2524058","DOIUrl":"https://doi.org/10.1109/XNANO.2016.2524058","url":null,"abstract":"Provides a listing of the editors, board members, and current staff for this issue of the publication.","PeriodicalId":100627,"journal":{"name":"IEEE Nanotechnology Express","volume":"1 ","pages":"C2-C2"},"PeriodicalIF":0.0,"publicationDate":"2015-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/XNANO.2016.2524058","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"49974452","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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