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Decomposition Mechanism of SF6 by Long DC Arc Plasma 长直流电弧等离子体分解SF6的机理
IF 0.4 4区 工程技术 Q4 Chemical Engineering Pub Date : 2021-11-20 DOI: 10.1252/kakoronbunshu.47.211
K. Matsui, Manabu Tanaka, T. Watanabe
Carbon tetrafluoride, CF4, is mainly used as the dry etching gas in the semiconductor industry. CF4 has a high global warming potential about 6,500, and is difficult to be decomposed. Various decomposition treatment methods are currently being used. A combustion and a catalyst degradation are widely implemented, while these methods possess some problems. The combustion method has insufficient temperature, which leads to nonnegligible emissions of NOx and SOx. Catalytic degradation is high cost process due to the replacement of catalysts, resulting from the poisoning of catalysts by sulfur and HF [1]. Abatement processing with thermal plasmas has been implemented in industrial fields due to their advantages of high temperature and high chemical activity. Long DC arc has a long electrode gap distance of 300 mm. This configuration leads to sufficiently long residence time for decomposition of harmful target [2]. The purpose of this study is to decompose CF4 by long DC arc and to investigate decomposition mechanism. The setup consists of a power supply, a plasma torch, and a scrubber. The arc current was 10 A. Nitrogen at 25 L/min was used as the plasma gas, while CF4 was injected at 0.5 L/min. Steam was introduced as the additive gas, and the flow rate was changed from 0.0 to 2.0 L/min. This is because H, O, and OH radicals dissociated from H2O molecular inhibit recombination of CF4 outside the discharge area. Molar ratio of H/F was changed as 0.0, 0.5, 1.0 and 2.0. The produced gases were analyzed by a gas chromatograph (GC) and a quadrupole mass spectrometer (QMS) to investigate the destruction and removal efficiency (DRE) and the composition of the produced gases. Figure 1 shows the relationship between the H/F molar ratio and DRE. The DRE was 0% without steam addition. This is because C and F radicals are easily recombined to CF4 after thermal decomposition. The maximum DRE of 97% was achieved with the steam flow rate of 2.0 L/min. High flow rate of steam leads to strong oxidation atmosphere, therefore C and O combine to form stable CO and CO2. In addition, highly reactive F radicals were recovered by forming HF. Figure 2 shows the mass spectra of the produced gases. The peaks of CF3 were decreased with the increase of H/F ratio. NO peak was detected only at H/F=2.0. A strong oxidizing atmosphere promoted the decomposition of CF4 and generation of nitrogen oxides. The recombination mechanism of CF4 after plasma decomposition is discussed here on the basis of thermodynamic consideration. Recombination temperature of HF is 4,740 K, while that of CF is 4,670 K, estimated from the temperature dependence of Gibbs free energy change. This small difference of recombination temperatures suggests that the recovery of F radicals by H is difficult due to the competitive reaction of CF recombination. In contrast, the recombination temperature of CO is 7,600 K. This fact indicates that the recovery of C by O radical is a key reaction to suppress CF4 recombin
四氟化碳(CF4)在半导体工业中主要用作干蚀刻气体。CF4具有较高的全球变暖潜势,约为6500,且难以分解。目前正在使用各种分解处理方法。燃烧法和催化剂降解法已被广泛应用,但存在一些问题。燃烧方法温度不足,导致NOx和SOx的排放不可忽略。催化降解是一个成本较高的过程,因为催化剂会被硫和HF毒害,需要更换催化剂[1]。热等离子体具有高温、高化学活性等优点,在工业领域得到了广泛应用。长直流电弧电极间隙距离长300mm。这种结构使得有足够长的停留时间分解有害目标物[2]。本研究的目的是利用长直流电弧对CF4进行分解,并探讨分解机理。该装置由电源、等离子炬和洗涤器组成。电弧电流为10a。以25l /min氮气作为等离子体气体,以0.5 L/min注入CF4。引入蒸汽作为添加气体,流量由0.0 L/min调整为2.0 L/min。这是因为从H2O分子解离的H、O和OH自由基抑制了CF4在放电区域外的重组。H/F的摩尔比分别为0.0、0.5、1.0和2.0。采用气相色谱仪(GC)和四极杆质谱仪(QMS)对产气进行了分析,考察了产气的破坏和去除效率(DRE)以及产气的组成。图1显示了H/F摩尔比与DRE的关系。不加蒸汽的DRE为0%。这是因为C和F自由基在热分解后很容易重组为CF4。当蒸汽流量为2.0 L/min时,DRE最高可达97%。蒸汽流速大,氧化气氛强,C和O结合形成稳定的CO和CO2。此外,高活性的F自由基通过形成HF被回收。图2显示了所产生气体的质谱。CF3的峰值随着H/F比的增加而降低。仅在H/F=2.0时检测到NO峰。强氧化气氛促进了CF4的分解和氮氧化物的生成。本文从热力学角度探讨了等离子体分解后CF4的复合机理。根据吉布斯自由能变化的温度依赖性估计,HF的复合温度为4740 K, CF的复合温度为4670 K。这种微小的复合温度差异表明,由于CF复合的竞争性反应,H很难恢复F自由基。CO的复合温度为7600 K。这表明O自由基对C的恢复是抑制CF4重组的关键反应。在充足的蒸汽加入下,用长直流电弧成功地分解了CF4。DRE随H/F摩尔比和氧化气氛的增加而增加。由于能够完全分解替代PFC气体,长直流电弧系统有望在半导体工业中发挥积极作用。
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引用次数: 0
Fabrication of Self-Supporting Geopolymer Membranes and Gas Permeation through the Membranes 自支撑地聚合物膜的制备及其气体通过膜的研究
IF 0.4 4区 工程技术 Q4 Chemical Engineering Pub Date : 2021-11-20 DOI: 10.1252/kakoronbunshu.47.206
M. Abe, M. Noguchi, A. Yamasaki
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引用次数: 0
Feasibility Study of Micro Kalina Cycle for Hot Spring Power Generation 微卡丽娜循环用于温泉发电的可行性研究
IF 0.4 4区 工程技术 Q4 Chemical Engineering Pub Date : 2021-09-20 DOI: 10.1252/kakoronbunshu.47.143
Ryosuke Akimoto, Takehiro Yamaki, Yasuhiko Suzuki, M. Nakaiwa, Keigo Matsuda
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引用次数: 0
Recovery of Rare Earths using Anion-Supporting Polymer Gel 阴离子负载型聚合物凝胶回收稀土
IF 0.4 4区 工程技术 Q4 Chemical Engineering Pub Date : 2021-09-20 DOI: 10.1252/kakoronbunshu.47.161
Kensho Hanai, Takehiko Gotoh, S. Nakai
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引用次数: 0
Effect of Aspect Ratio on Mixed Convection Heat Transfer from the Heated Bottom Wall in Horizontal Rectangular Channel 宽高比对水平矩形通道受热底壁混合对流换热的影响
IF 0.4 4区 工程技术 Q4 Chemical Engineering Pub Date : 2021-09-20 DOI: 10.1252/kakoronbunshu.47.132
Kazuya Miura, Hideki Tokanai
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引用次数: 0
Fault Diagnosis Filter for Sensor and Actuator Based on System Identification Model 基于系统辨识模型的传感器和执行器故障诊断滤波器
IF 0.4 4区 工程技术 Q4 Chemical Engineering Pub Date : 2021-09-20 DOI: 10.1252/kakoronbunshu.47.148
K. Yunoki
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引用次数: 0
General Estimation of Just-Drawdown Speed of Floating Solids in Solid–Liquid Agitated Vessels 固液搅拌容器中漂浮固体刚降速度的一般估计
IF 0.4 4区 工程技术 Q4 Chemical Engineering Pub Date : 2021-09-20 DOI: 10.1252/kakoronbunshu.47.125
M. Aida, A. Shono
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引用次数: 0
Evaluation of Performance and Durability of Calcium Ferrite in CO2–CO Conversion 铁酸钙在CO2-CO转化中的性能和耐久性评价
IF 0.4 4区 工程技术 Q4 Chemical Engineering Pub Date : 2021-09-20 DOI: 10.1252/kakoronbunshu.47.169
K. Kamiya, Nobusuke Kobayashi, Y. Itaya, Tsuguhiko Nakagawa
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引用次数: 0
Effect of Medium Concentration on Specific Growth Rate of Blue–Green alga, Spirulina platensis 培养基浓度对蓝绿藻(螺旋藻)特定生长速率的影响
IF 0.4 4区 工程技术 Q4 Chemical Engineering Pub Date : 2021-09-20 DOI: 10.1252/kakoronbunshu.47.140
Y. Ohira, Masamitsu Shimadzu
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引用次数: 0
A New Concept of Convective Mixing Pattern 对流混合型的新概念
IF 0.4 4区 工程技术 Q4 Chemical Engineering Pub Date : 2021-07-20 DOI: 10.1252/KAKORONBUNSHU.47.85
Y. Inoue
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引用次数: 0
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