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Electrophotographic properties of Michlers ketone-polymer double-layer systems Michlers酮-聚合物双层体系的电照相性能
Pub Date : 1985-06-01 DOI: 10.1016/0376-4583(85)90029-9
P.K.C. Pillai, Niloufer Shroff, A.K. Tripathi

Solution-sprayed cured layers of Michlers ketone were overcoated with various polymers to enhance their charge acceptance. It is found that an overlayer of poly(vinyl butyral) gives the best electrophotographic characteristics, showing a maximum charge acceptance of 825 V and a contrast potential of 540 V.

在溶液喷射固化层上涂上各种聚合物以提高其电荷接受度。结果表明,聚乙烯基丁醛涂层具有最佳的光电特性,最大电荷接受电压为825 V,对比电位为540 V。
{"title":"Electrophotographic properties of Michlers ketone-polymer double-layer systems","authors":"P.K.C. Pillai,&nbsp;Niloufer Shroff,&nbsp;A.K. Tripathi","doi":"10.1016/0376-4583(85)90029-9","DOIUrl":"10.1016/0376-4583(85)90029-9","url":null,"abstract":"<div><p>Solution-sprayed cured layers of Michlers ketone were overcoated with various polymers to enhance their charge acceptance. It is found that an overlayer of poly(vinyl butyral) gives the best electrophotographic characteristics, showing a maximum charge acceptance of 825 V and a contrast potential of 540 V.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 2","pages":"Pages 159-165"},"PeriodicalIF":0.0,"publicationDate":"1985-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90029-9","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86485196","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Influence of the continuous mechanical renewal of the electrode surface on the effective activation energy of copper deposition on a copper cathode in the Tafel potential region 电极表面连续机械更新对铜阴极上Tafel电位区铜沉积有效活化能的影响
Pub Date : 1985-06-01 DOI: 10.1016/0376-4583(85)90026-3
C.I. Noninski, L.P. Veleva, V.C. Noninski

The influence of the continuous mechanical renewal of the electrode surface on the effective activation energy of copper deposition on a copper cathode in the Tafel potential region was studied using a self-cleaning rotating electrode. The effective activation energy decreased by about 5 kcal mol-1 when the cathode was continuously mechanically renewed.

采用自清洁旋转电极,研究了电极表面连续机械更新对铜阴极Tafel电位区沉积铜的有效活化能的影响。连续机械更新阴极时,有效活化能降低约5 kcal mol-1。
{"title":"Influence of the continuous mechanical renewal of the electrode surface on the effective activation energy of copper deposition on a copper cathode in the Tafel potential region","authors":"C.I. Noninski,&nbsp;L.P. Veleva,&nbsp;V.C. Noninski","doi":"10.1016/0376-4583(85)90026-3","DOIUrl":"10.1016/0376-4583(85)90026-3","url":null,"abstract":"<div><p>The influence of the continuous mechanical renewal of the electrode surface on the effective activation energy of copper deposition on a copper cathode in the Tafel potential region was studied using a self-cleaning rotating electrode. The effective activation energy decreased by about 5 kcal mol<sup>-1</sup> when the cathode was continuously mechanically renewed.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 2","pages":"Pages 135-139"},"PeriodicalIF":0.0,"publicationDate":"1985-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90026-3","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74486640","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Experimental investigation of mass transport in pulse plating 脉冲镀中质量输运的实验研究
Pub Date : 1985-06-01 DOI: 10.1016/0376-4583(85)90022-6
M. Datta, D. Landolt

Mass transport during the electrodeposition of copper from acidified sulphate solution using single and multiple pulses was studied. Experimental results obtained in a diffusion cell and with a rotating hemispherical electrode are compared with published theoretical calculations of various degrees of mathematical sophistication and complexity. The simple duplex diffusion-layer model proposed by Ibl gives adequate values of the pulse limiting current density for many practical purposes. The agreement with experiment can be further improved by using a semi-empirical modification of the model.

研究了单脉冲和多脉冲电沉积铜的过程。在扩散池和旋转半球形电极中获得的实验结果与发表的不同程度的数学复杂性和复杂性的理论计算进行了比较。Ibl提出的简单双扩散层模型给出了足够的脉冲限制电流密度值,适用于许多实际用途。通过对模型进行半经验修正,可以进一步提高模型与实验的一致性。
{"title":"Experimental investigation of mass transport in pulse plating","authors":"M. Datta,&nbsp;D. Landolt","doi":"10.1016/0376-4583(85)90022-6","DOIUrl":"10.1016/0376-4583(85)90022-6","url":null,"abstract":"<div><p>Mass transport during the electrodeposition of copper from acidified sulphate solution using single and multiple pulses was studied. Experimental results obtained in a diffusion cell and with a rotating hemispherical electrode are compared with published theoretical calculations of various degrees of mathematical sophistication and complexity. The simple duplex diffusion-layer model proposed by Ibl gives adequate values of the pulse limiting current density for many practical purposes. The agreement with experiment can be further improved by using a semi-empirical modification of the model.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 2","pages":"Pages 97-110"},"PeriodicalIF":0.0,"publicationDate":"1985-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90022-6","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79264749","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 56
A Study of the influence of pH on the corrosion rate of aluminium pH值对铝腐蚀速率影响的研究
Pub Date : 1985-05-01 DOI: 10.1016/0376-4583(85)90047-0
V. Vujičić, B. Lovreček

Extensive investigations of the aluminium electrolyte interface were undertaken in order to check the pH dependence of the corrosion rate aluminium, i.e. the pH value at which the rate of aluminium corrosion is lowest. Part of this research which deals with measurements of the loss of mass and polarization resistance as functions of pH is presented in this paper. The measurements were performed over a broad range of pH in the presence and absence of ethylenediamine inhibitor. The results are shown as plots of log(1/Rp) and log Δm against the pH. Two straight lines of opposite slope were obtained for each method of investigation and each system investigated. The intercepts obtained by extrapolating the straight lines, which represent minima of 1/Rp and mass loss, indicate the corresponding pH values. The results obtained are discussed in terms of the interaction of water dipoles with the oxide film during the corrosion process. The change in the surface charge of the corroding aluminium as the pH is altered plays an important role in the corrosion process.

为了检查腐蚀速率铝的pH依赖性,即铝腐蚀速率最低的pH值,对铝电解质界面进行了广泛的调查。本文介绍了该研究的部分内容,即质量损失和极化电阻随pH值的变化。在存在和不存在乙二胺抑制剂的情况下,测量在广泛的pH范围内进行。结果显示为log(1/Rp)和log Δm随ph值的曲线。每种调查方法和每种系统都得到了两条相对斜率的直线。通过外推直线得到的截距表示1/Rp和质量损失的最小值,表示相应的pH值。从腐蚀过程中水偶极子与氧化膜相互作用的角度讨论了所得结果。随着pH值的改变,腐蚀铝表面电荷的变化在腐蚀过程中起着重要的作用。
{"title":"A Study of the influence of pH on the corrosion rate of aluminium","authors":"V. Vujičić,&nbsp;B. Lovreček","doi":"10.1016/0376-4583(85)90047-0","DOIUrl":"10.1016/0376-4583(85)90047-0","url":null,"abstract":"<div><p>Extensive investigations of the aluminium electrolyte interface were undertaken in order to check the pH dependence of the corrosion rate aluminium, <em>i.e.</em> the pH value at which the rate of aluminium corrosion is lowest. Part of this research which deals with measurements of the loss of mass and polarization resistance as functions of pH is presented in this paper. The measurements were performed over a broad range of pH in the presence and absence of ethylenediamine inhibitor. The results are shown as plots of log(1/<em>R</em><sub>p</sub>) and log Δ<em>m</em> against the pH. Two straight lines of opposite slope were obtained for each method of investigation and each system investigated. The intercepts obtained by extrapolating the straight lines, which represent minima of 1/<em>R</em><sub>p</sub> and mass loss, indicate the corresponding pH values. The results obtained are discussed in terms of the interaction of water dipoles with the oxide film during the corrosion process. The change in the surface charge of the corroding aluminium as the pH is altered plays an important role in the corrosion process.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 1","pages":"Pages 49-57"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90047-0","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73589561","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 17
Nucleation control and growth kinetics of ammonium hydrogen tartrate single crystals in silica gels 酒石酸氢铵单晶在硅胶中的成核控制及生长动力学
Pub Date : 1985-05-01 DOI: 10.1016/0376-4583(85)90050-0
C.C. Desai, A.N. Hanchinal

A detailed study of the variation in the nucleation density and growth of ammonium hydrogen tartrate (AHT) single crystals as a function of the concentration of the feed solution, the gel density, the gel pH, the gel aging time and the temperature is presented. Whereas opaque crystals were produced from high density high pH gels, good quality transparent single crystals were obtained in low density low pH gels. The use of intermediate neutral gel column and gel aging times considerably reduces the number of nucleation sites. The nucleation density decreases as the temperature increases. A simple procedure to control nucleation sites in gels was adopted and resulted in a dramatic increase in the size of the crystals. Kinetics studies of the nucleation and growth of AHT needle crystals showed that these crystals grow by a one-dimensional diffusion-controlled reaction between ammonium chloride and tartaric acid. The implications of this behaviour are discussed.

本文详细研究了进料液浓度、凝胶密度、凝胶pH、凝胶时效时间和温度对酒石酸氢铵(AHT)单晶成核密度和生长的影响。高密度的高pH凝胶可以得到不透明的晶体,而低密度的低pH凝胶可以得到高质量的透明单晶。中间中性凝胶柱的使用和凝胶老化时间大大减少了成核位点的数量。随着温度的升高,成核密度减小。采用了一种简单的方法来控制凝胶中的成核位置,结果晶体的大小急剧增加。AHT针状晶体的成核和生长动力学研究表明,这些晶体是由氯化铵和酒石酸之间的一维扩散控制反应生长的。讨论了这种行为的含义。
{"title":"Nucleation control and growth kinetics of ammonium hydrogen tartrate single crystals in silica gels","authors":"C.C. Desai,&nbsp;A.N. Hanchinal","doi":"10.1016/0376-4583(85)90050-0","DOIUrl":"10.1016/0376-4583(85)90050-0","url":null,"abstract":"<div><p>A detailed study of the variation in the nucleation density and growth of ammonium hydrogen tartrate (AHT) single crystals as a function of the concentration of the feed solution, the gel density, the gel pH, the gel aging time and the temperature is presented. Whereas opaque crystals were produced from high density high pH gels, good quality transparent single crystals were obtained in low density low pH gels. The use of intermediate neutral gel column and gel aging times considerably reduces the number of nucleation sites. The nucleation density decreases as the temperature increases. A simple procedure to control nucleation sites in gels was adopted and resulted in a dramatic increase in the size of the crystals. Kinetics studies of the nucleation and growth of AHT needle crystals showed that these crystals grow by a one-dimensional diffusion-controlled reaction between ammonium chloride and tartaric acid. The implications of this behaviour are discussed.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 1","pages":"Pages 69-76"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90050-0","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88543399","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
The use of the Nb-Nb2O5 electrode as an indicator electrode in potentiometric acid-base titrations in fused KNO3 Nb-Nb2O5电极作为指示电极在熔融KNO3酸碱电位滴定中的应用
Pub Date : 1985-05-01 DOI: 10.1016/0376-4583(85)90045-7
A. Baraka, A. Abdel-Razik, A.I. Abdel-Rohman

An Nb-Nb2O5 electrode was prepared by the electrolytic oxidation of niobium in molten KNO3. This electrode can be used as an indicator electrode in potentiometric acid-base titrations. It behaves reversibly and responds theoretically to the oxide ion concentration in molten KNO3. Its potential varies linearly with ln[O2-] and the line has a slope of 68 mV at 350 °C. The standard potential of the Nb-Nb2O5, O2- electrode, i.e. the potential at [O2-] = 1, is computed as -810 mV with respect to the Ag-Ag+ reference electrode.

在熔融KNO3中电解氧化铌,制备了Nb-Nb2O5电极。该电极可用作电位滴定酸碱滴定的指示电极。它的行为是可逆的,理论上对熔融KNO3中氧化离子浓度有响应。它的电位随ln[O2-]线性变化,在350℃时,线的斜率为68 mV。Nb-Nb2O5, O2-电极的标准电位,即[O2-] = 1处的电位,相对于Ag-Ag+参比电极计算为-810 mV。
{"title":"The use of the Nb-Nb2O5 electrode as an indicator electrode in potentiometric acid-base titrations in fused KNO3","authors":"A. Baraka,&nbsp;A. Abdel-Razik,&nbsp;A.I. Abdel-Rohman","doi":"10.1016/0376-4583(85)90045-7","DOIUrl":"10.1016/0376-4583(85)90045-7","url":null,"abstract":"<div><p>An Nb-Nb<sub>2</sub>O<sub>5</sub> electrode was prepared by the electrolytic oxidation of niobium in molten KNO<sub>3</sub>. This electrode can be used as an indicator electrode in potentiometric acid-base titrations. It behaves reversibly and responds theoretically to the oxide ion concentration in molten KNO<sub>3</sub>. Its potential varies linearly with ln[O<sup>2-</sup>] and the line has a slope of 68 mV at 350 °C. The standard potential of the Nb-Nb<sub>2</sub>O<sub>5</sub>, O<sup>2-</sup> electrode, <em>i.e.</em> the potential at [O<sup>2-</sup>] = 1, is computed as -810 mV with respect to the Ag-Ag<sup>+</sup> reference electrode.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 1","pages":"Pages 31-38"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90045-7","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81196069","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
An electron microscopy study of the initial stages of dendrite formation in electrodeposited zinc 电沉积锌中枝晶形成初期的电镜研究
Pub Date : 1985-05-01 DOI: 10.1016/0376-4583(85)90042-1
Ingon Kim, Rolf Weil

The beginnings of dendrite formation in electrodeposited zinc were investigated by electron microscopy. Numerous dendritically shaped crystallites were already present in the very early stages of deposition. They had definite crystallographic characteristics. Only a few of these crystallites developed into optically visible dendrites. High local current densities favored the development of fewer, but larger, dendrites.

用电子显微镜研究了锌电沉积过程中枝晶的形成过程。在沉积的早期阶段已经出现了许多枝状晶体。它们具有明确的晶体学特征。这些晶体中只有少数发展成光学可见的枝晶。较高的局部电流密度有利于树突的发育,树突数量少,但体积大。
{"title":"An electron microscopy study of the initial stages of dendrite formation in electrodeposited zinc","authors":"Ingon Kim,&nbsp;Rolf Weil","doi":"10.1016/0376-4583(85)90042-1","DOIUrl":"10.1016/0376-4583(85)90042-1","url":null,"abstract":"<div><p>The beginnings of dendrite formation in electrodeposited zinc were investigated by electron microscopy. Numerous dendritically shaped crystallites were already present in the very early stages of deposition. They had definite crystallographic characteristics. Only a few of these crystallites developed into optically visible dendrites. High local current densities favored the development of fewer, but larger, dendrites.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 1","pages":"Pages 1-6"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90042-1","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80620455","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Electrodeposition of alloys XV: Electrodeposition and x-ray structure of Bi-In alloys 合金的电沉积XV: Bi-In合金的电沉积和x射线结构
Pub Date : 1985-05-01 DOI: 10.1016/0376-4583(85)90044-5
Y.N. Sadana, Z.Z. Wang

Bi-In alloys containing up to 90% In were electrodeposited from aqueous solutions containing the diethylenetriaminepentaacetate ion as the complexing agent. An increase in the current density and the indium content of the bath decreased the percentage of bismuth in the deposit. The current efficiency decreased with increasing current density but was not significantly affected by a change in the indium content of the bath. Deposits containing 63%–89% In were of good visual quality and offer promise as a decorative finish. The X-ray phase structure of the deposited alloys is reported.

在以二乙烯三胺五乙酸离子为络合剂的水溶液中,电沉积了含有高达90% In的铋合金。电流密度的增加和镀液中铟含量的增加降低了镀层中铋的百分比。电流效率随电流密度的增加而降低,但不受镀液中铟含量变化的显著影响。含有63%-89% In的镀层具有良好的视觉质量,有望作为装饰饰面。报道了沉积合金的x射线相结构。
{"title":"Electrodeposition of alloys XV: Electrodeposition and x-ray structure of Bi-In alloys","authors":"Y.N. Sadana,&nbsp;Z.Z. Wang","doi":"10.1016/0376-4583(85)90044-5","DOIUrl":"10.1016/0376-4583(85)90044-5","url":null,"abstract":"<div><p>Bi-In alloys containing up to 90% In were electrodeposited from aqueous solutions containing the diethylenetriaminepentaacetate ion as the complexing agent. An increase in the current density and the indium content of the bath decreased the percentage of bismuth in the deposit. The current efficiency decreased with increasing current density but was not significantly affected by a change in the indium content of the bath. Deposits containing 63%–89% In were of good visual quality and offer promise as a decorative finish. The X-ray phase structure of the deposited alloys is reported.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 1","pages":"Pages 17-29"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90044-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88211840","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Non-dislocation thermal etch pits on calcite cleavages 方解石解理上的无位错热蚀坑
Pub Date : 1985-05-01 DOI: 10.1016/0376-4583(85)90048-2
A.J. Shah, J.R. Pandya

Thermal etch pits with rhombic outlines on the cleavage surfaces of natural calcite crystals are observed in a narrow range of etching temperature between 540 and 625 °C in air. The thermal etch rates Vt and Vs of the tangential dissolution of ledges and the surface dissolution respectively were determined in the above temperature range. The activation energies Et th and Es th of tangential thermal dissolution and surface thermal dissolution respectively are calculated and are compared with those of controlled chemical dissolution initiated to produce dislocation etch pits on calcite cleavages. A quantitative study of the activation energies suggests that the thermal etch pits on calcite cleavage faces originate at dislocation-free sites such as kinks, steps and/or impurity centres.

在540 ~ 625℃的空气中,在天然方解石晶体解理面上观察到具有菱形轮廓的热蚀坑。在此温度范围内,分别测定了切向溶解和表面溶解的热腐蚀速率Vt和v。分别计算了切向热溶解和表面热溶解的活化能Et和Es,并与方解石解理上产生位错蚀坑的受控化学溶解的活化能Et和Es进行了比较。活化能的定量研究表明,方解石解理面上的热蚀坑起源于无位错的位置,如扭结、台阶和/或杂质中心。
{"title":"Non-dislocation thermal etch pits on calcite cleavages","authors":"A.J. Shah,&nbsp;J.R. Pandya","doi":"10.1016/0376-4583(85)90048-2","DOIUrl":"10.1016/0376-4583(85)90048-2","url":null,"abstract":"<div><p>Thermal etch pits with rhombic outlines on the cleavage surfaces of natural calcite crystals are observed in a narrow range of etching temperature between 540 and 625 °C in air. The thermal etch rates <em>V</em><sub>t</sub> and <em>V</em><sub>s</sub> of the tangential dissolution of ledges and the surface dissolution respectively were determined in the above temperature range. The activation energies <em>E</em><sub>t th</sub> and <em>E</em><sub>s th</sub> of tangential thermal dissolution and surface thermal dissolution respectively are calculated and are compared with those of controlled chemical dissolution initiated to produce dislocation etch pits on calcite cleavages. A quantitative study of the activation energies suggests that the thermal etch pits on calcite cleavage faces originate at dislocation-free sites such as kinks, steps and/or impurity centres.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 1","pages":"Pages 59-64"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90048-2","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86021397","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Benzotriazole as a corrosion inhibitor for brass 苯并三唑作为黄铜的缓蚀剂
Pub Date : 1985-05-01 DOI: 10.1016/0376-4583(85)90046-9
S.H. Sanad, H. Abbas, A.A. Ismail, K.M. El-Sobki

The effect of benzotriazole (BTA) on the corrosion of brass in 0.1 N HCl, 0.1 N H2SO4 and 0.1 N NH4Cl was studied by means of immersion tests and galvanostatic measurements. BTA showed a good inhibition effect in some corrosive media. The percentage inhibition in 0.1 N HCl solution was found to increase with increasing BTA concentration. In contrast, the percentage inhibition in 0.1 N H2SO4 was inversely proportional to the BTA concentration. The highest inhibition efficiency was obtained in 0.1 N NH4Cl. The role of BTA as an inhibitor for brass was explained in terms of the chemisorption of BTA molecules at some active sites on brass surfaces.

通过浸渍试验和恒流测量,研究了苯并三唑(BTA)在0.1 N HCl、0.1 N H2SO4和0.1 N NH4Cl中对黄铜腐蚀的影响。BTA在某些腐蚀性介质中表现出良好的缓蚀效果。在0.1 N HCl溶液中,抑制率随BTA浓度的增加而增加。相反,0.1 N H2SO4的抑制率与BTA浓度成反比。在0.1 N NH4Cl溶液中抑菌率最高。BTA分子在黄铜表面某些活性位点的化学吸附解释了BTA作为黄铜缓蚀剂的作用。
{"title":"Benzotriazole as a corrosion inhibitor for brass","authors":"S.H. Sanad,&nbsp;H. Abbas,&nbsp;A.A. Ismail,&nbsp;K.M. El-Sobki","doi":"10.1016/0376-4583(85)90046-9","DOIUrl":"10.1016/0376-4583(85)90046-9","url":null,"abstract":"<div><p>The effect of benzotriazole (BTA) on the corrosion of brass in 0.1 N HCl, 0.1 N H<sub>2</sub>SO<sub>4</sub> and 0.1 N NH<sub>4</sub>Cl was studied by means of immersion tests and galvanostatic measurements. BTA showed a good inhibition effect in some corrosive media. The percentage inhibition in 0.1 N HCl solution was found to increase with increasing BTA concentration. In contrast, the percentage inhibition in 0.1 N H<sub>2</sub>SO<sub>4</sub> was inversely proportional to the BTA concentration. The highest inhibition efficiency was obtained in 0.1 N NH<sub>4</sub>Cl. The role of BTA as an inhibitor for brass was explained in terms of the chemisorption of BTA molecules at some active sites on brass surfaces.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 1","pages":"Pages 39-48"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90046-9","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74370735","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 12
期刊
Surface Technology
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