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Front Matter: Volume 10919 封面:第10919卷
Pub Date : 2019-05-09 DOI: 10.1117/12.2532003
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引用次数: 0
Deposition and structure transformation of ultra-wide bandgap ZnGa2O4 materials (Conference Presentation) 超宽带隙ZnGa2O4材料的沉积与结构转变(会议报告)
Pub Date : 2019-03-08 DOI: 10.1117/12.2511340
D. Wuu, Shiau‐Yuan Huang, Shuo-Huang Yuan, R. Horng, S. Ou, Bo-Wen Shiao
Ultra-wide bandgap zinc gallium oxide (ZGO) and GO films were prepared on c-plane sapphire by conventional radio-frequency magnetron sputtering. In the current sputtered oxide studies, target composition or growth temperature is usually the main deposition variable, and the other growth conditions are fixed. This would make it difficult to fully understand the theory and characterization of ZGO films. In this study, several growth parameters as well as the post-thermal treatment were all modulated to realize and optimize the ZGO growth. From x-ray and TEM analyses, stabilization of stoichiometry and control of crystallinity transformation were confirmed to be important factors in determining the film quality. The optical bandgap of ZGO can reach 5.0-5.1 eV with a maximum responsivity peak at 240 nm. A metal-semiconductor-metal photodetector is demonstrated with a maximum responsivity over 2 A/W under a 5-V biased voltage. Furthermore, the photo/dark current ratio can be improved to be over ten thousand. As compared with those of the sputtered GO photodetector, the spectral response peak of ZGO showed a blue shift to 240 nm with higher responsivity. The data presented exhibit the ZGO material will become another potential candidate for ultra-wide bandgap semiconductor applications.
采用常规射频磁控溅射技术在c面蓝宝石表面制备了超宽带隙氧化锌镓(ZGO)及其氧化镓薄膜。在目前的溅射氧化物研究中,靶成分或生长温度通常是主要的沉积变量,其他生长条件是固定的。这将使我们很难完全理解ZGO薄膜的理论和表征。在本研究中,通过调节几个生长参数和后热处理来实现和优化ZGO的生长。通过x射线和透射电镜分析,证实了化学计量学的稳定性和结晶转变的控制是决定膜质量的重要因素。ZGO的光带隙可达5.0 ~ 5.1 eV,最大响应峰在240 nm处。一种金属-半导体-金属光电探测器在5v偏置电压下的最大响应度超过2 A/W。此外,光/暗电流比可以提高到10000以上。与溅射氧化石墨烯光电探测器相比,ZGO的光谱响应峰蓝移至240 nm,响应率更高。所提供的数据表明,ZGO材料将成为超宽带隙半导体应用的另一个潜在候选者。
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引用次数: 0
Using small low-temperature quantum effects to calculate 300-K mobility in complex degenerate semiconductors: Ga2O3 (Conference Presentation) 利用低温小量子效应计算复杂简并半导体中的300-K迁移率:Ga2O3(会议报告)
Pub Date : 2019-03-08 DOI: 10.1117/12.2516138
D. Look
With a high bandgap of 4.7 eV, β-Ga2O3 can be made semi-insulating by doping with Fe or Mg and thereby possesses a very high breakdown field necessary for high-powered switches. Somewhat surprisingly, β-Ga2O3 can also be made highly conductive by doping with Si, which leads to great potential for n+ohmic contacts and transparent current spreading layers. In the latter application, the goal is to achieve both high conductivity (high concentration n and mobility μ) and high transparency in the visible and UV regions. Recently we have achieved n = 2 x 1020 cm-3 in β-Ga2O3, using pulsed laser deposition (PLD) with a Ga2O3 target containing 1-wt%-SiO2. Although n is temperature-independent, µ is not, and by fitting µ vs T, we can determine donor ND and acceptor NA concentrations. However, at higher temperatures, µ is strongly affected by longitudinal optical (LO) phonon scattering, which is much more complicated to model in Ga2O3 (9 LO phonons) than in ZnO, GaN, and other binary semiconductors (1 LO phonon). Highly-doped samples have another complication, disorder in the dopant placement. Fortunately, this disorder leads to small quantum corrections delta sigma in the conductivity which are also affected by LO phonons. Indeed, the study of delta sigma vs T and vs magnetic field B at low temperatures is crucial in understanding mobility at 300 K. We demonstrate calculations of ND and NA in PLD-grown β-Ga2O3 under the assumption that the dominant acceptor is the Ga vacancy in various charge states.
通过掺入Fe或Mg, β-Ga2O3具有4.7 eV的高带隙,可以实现半绝缘,从而具有大功率开关所需的高击穿场。令人惊讶的是,通过掺杂Si, β-Ga2O3也可以获得高导电性,这导致了n+的极具潜力的触点和透明电流扩散层。在后一种应用中,目标是实现高电导率(高浓度n和迁移率μ)和可见光和紫外区域的高透明度。最近,我们利用脉冲激光沉积(PLD)在含有1 wt%-SiO2的Ga2O3靶上实现了β-Ga2O3的n = 2 × 1020 cm-3。虽然n与温度无关,但µ不是,通过拟合µvs T,我们可以确定供体ND和受体NA浓度。然而,在较高的温度下,µ受到纵向光学(LO)声子散射的强烈影响,这在Ga2O3(9个LO声子)中比在ZnO, GaN和其他二元半导体(1个LO声子)中要复杂得多。高掺杂的样品还有另一个并发症,即掺杂剂放置的无序性。幸运的是,这种无序导致电导率的小量子修正δ σ,这也受到LO声子的影响。事实上,在低温下σ对T和对磁场B的研究对于理解300 K下的迁移率至关重要。我们演示了在pld生长的β-Ga2O3中ND和NA的计算,假设主要受体是各种电荷态的Ga空位。
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引用次数: 0
Mid-infrared optical waveguide using ferroelectric oxides (Conference Presentation) 使用铁电氧化物的中红外光波导(会议报告)
Pub Date : 2019-03-08 DOI: 10.1117/12.2508290
P. Lin, Tiening Jin, Junchao Zhou
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引用次数: 0
Shining light on oxide-based nanostructures: tunable plasmonics and spintronics (Conference Presentation) 基于氧化物的纳米结构:可调谐等离子体和自旋电子学(会议报告)
Pub Date : 2019-03-08 DOI: 10.1117/12.2511297
R. Serna, J. Toudert, A. Mariscal
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引用次数: 0
Inspection and functionality convergence (Conference Presentation) 检查和功能融合(会议报告)
Pub Date : 2019-03-08 DOI: 10.1117/12.2518129
Matthew C. Putman, V. Pinskiy, D. Sharoukhov
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引用次数: 0
Modeling of phase transitions in aluminum-gallium oxide alloys (Conference Presentation) 铝-氧化镓合金相变的建模(会议报告)
Pub Date : 2019-03-08 DOI: 10.1117/12.2514838
C. Bǎdescu
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引用次数: 0
Kinetics of charge carrier recombination in beta-Ga2O3 single crystals (Conference Presentation) β - ga2o3单晶中载流子复合动力学(会议报告)
Pub Date : 2019-03-08 DOI: 10.1117/12.2518229
C. Ton‐That, T. Huynh, L. L. Lem, A. Kuramata, M. Phillips
We used temperature-resolved cathodoluminescence to determine the characteristics of luminescence bands and carrier dynamics in edge-defined film-fed grown (EFG) beta-Ga2O3 single crystals synthesized by Tamura Corporation. The crystal is nominally undoped and has a (-201) surface orientation. The main impurities are Si, Ir, Al and Fe, with [Fe] ~ 10^17 cm-3 verified by Inductively Coupled Plasma Mass Spectrometry (ICP-MS). The CL emission was found to be dominated by a broad UV emission peaked at 3.40 eV, which exhibits strong quenching with increasing temperature; however, its spectral shape and energy position remain virtually unchanged up to 500 K. Depth-resolved analysis reveals the luminescence spectrum is independent of sampling depth. We observed a super-linear increase of CL intensity with excitation density; this kinetics of carrier recombination can be explained in terms of carrier trapping and charge transfer at Fe3+/2+ centers. The temperature-dependent properties of this UV band were found to be consistent with weakly bound electrons in self-trapped excitons with an activation energy of 48 +/- 10 meV. In addition to the self-trapped exciton emission, a blue luminescence (BL) band is shown to be related to a donor-like defect, which increases significantly in concentration after remote hydrogen plasma treatment. The point defect responsible for the BL, likely an oxygen vacancy or a complex, is strongly coupled to the lattice with a Huang-Rhys factor S = 7.3.
利用温度分辨阴极发光技术,研究了Tamura公司合成的边缘薄膜生长(EFG) β - ga2o3单晶的发光带特征和载流子动力学。晶体名义上未掺杂,表面取向为(-201)。主要杂质为Si、Ir、Al和Fe,经电感耦合等离子体质谱(ICP-MS)验证为[Fe] ~ 10^17 cm-3。CL的发射以宽紫外为主,峰值在3.40 eV处,随温度升高表现出强猝灭;然而,它的光谱形状和能量位置几乎保持不变,直到500k。深度分辨分析表明,发光光谱与采样深度无关。我们观察到CL强度随激发密度呈超线性增长;载流子复合的动力学可以用Fe3+/2+中心的载流子捕获和电荷转移来解释。发现该UV带的温度依赖性与自捕获激子中的弱束缚电子相一致,活化能为48 +/- 10 meV。除了自捕获激子发射外,蓝色发光(BL)带与供体样缺陷有关,该缺陷在远距离氢等离子体处理后浓度显著增加。造成BL的点缺陷,可能是氧空位或络合物,与晶格强耦合,黄里斯因子S = 7.3。
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引用次数: 0
Development of electron-selective SiO2/TiO2 stack layers with superior surface passivation capacity for n-type silicon substrates (Conference Presentation) n型硅衬底具有优异表面钝化能力的电子选择性SiO2/TiO2堆叠层的开发(会议报告)
Pub Date : 2019-03-08 DOI: 10.1117/12.2510433
H. Nasser, Doğuşcan Ahiboz, Ezgi Aygun, M. Borra, Ozan Akdemir, A. Bek, R. Turan
In this work, the electron-carrier-selectivity of ALD deposited TiO2 contact on n-type and p-type c-Si wafers is presented. The optical, compositional, and diode quality dependence of TiO2 on the ALD deposition temperature were analyzed using spectroscopic ellipsometry, AFM, XPS, GI-XRD, and CV measurements. By optimizing the ALD process parameters, an impressive effective minority carrier lifetime of up to 2.3 milliseconds corresponding to an iVoc of ~700 mV was obtained from wet chemical oxide-SiO2/TiO2 passivation stack layers. Finally, the asymmetry in C-V and J-V measurements betweenTiO2/n-type and TiO2/p-type c-Si heterojunctions was examined and the electron transport selectivity of TiO2 was revealed.
本文研究了ALD沉积TiO2触点在n型和p型c-Si晶片上的电子载流子选择性。利用椭偏光谱、原子力显微镜、XPS、GI-XRD和CV测量分析了TiO2的光学、成分和二极管质量对ALD沉积温度的依赖性。通过优化ALD工艺参数,从湿化学氧化物- sio2 /TiO2钝化层中获得了高达2.3毫秒的有效少数载流子寿命,对应的iVoc为~700 mV。最后,研究了tio_2 /n型和tio_2 /p型c-Si异质结在C-V和J-V测量中的不对称性,揭示了tio_2 /n型和tio_2 /p型c-Si异质结的电子传递选择性。
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引用次数: 0
Through the (conducting) looking-glass: transparent conducting oxides for nanophotonic applications (Conference Presentation) 透过(导电)镜子:纳米光子应用的透明导电氧化物(会议报告)
Pub Date : 2019-03-08 DOI: 10.1117/12.2512275
A. Boltasseva, C. DeVault, V. Bruno, S. Saha, Z. Kudyshev, A. Dutta, S. Vezzoli, M. Ferrera, D. Faccio, V. Shalaev
Transparent Conducting Oxide (TCO) materials are degenerately-doped, wide-bandgap semiconductors which exhibit simultaneous high-conductivity and visible transparency. These unique properties are well known and frequently exploited for technologies such as touch-screen devices. In recent years, TCOs have been recognized as a promising material platform for nanophotonic devices, namely because of their simple, compatible fabrication, low-losses, dynamic modulation, and novel low-index properties. In this talk, I will highlight recent progress in the field of TCO-based nanophotonics, share our ongoing results and observations, and discuss future research challenges and directions. In particular, I will discuss our progress in developing metal-dielectric hybrid metasurfaces which incorporate TCOs for all-optical, ultrafast switching. Here, we incorporate defect-rich zinc oxide with a refractory titanium nitride metasurface for efficient light modulation at near-terahertz switching frequencies. My talk will also focus on TCO films for studying and observing low-index phenomena. Our recent work with aluminum-doped zinc oxide films demonstrates the ability for low-index materials to both enhance negative refraction and engender strongly coupled plasmonic systems with large room-temperature Rabi frequencies. Our work signifies the strong potential for incorporating transparent conducting oxides into plasmonic and nanophotonic devices to provide advances toward practical technologies and depth in scientific understanding.
透明导电氧化物(TCO)材料是简并掺杂的宽禁带半导体,同时具有高导电性和可见透明性。这些独特的特性是众所周知的,并且经常被用于触摸屏设备等技术。近年来,由于其简单、兼容、低损耗、动态调制和新颖的低折射率特性,tco已被公认为纳米光子器件的一个有前途的材料平台。在这次演讲中,我将重点介绍基于tco的纳米光子学领域的最新进展,分享我们正在进行的结果和观察,并讨论未来的研究挑战和方向。特别地,我将讨论我们在开发金属-介电混合超表面方面的进展,其中包含用于全光,超快开关的tco。在这里,我们将富含缺陷的氧化锌与难熔的氮化钛超表面结合在一起,用于近太赫兹开关频率下的高效光调制。我的演讲也将集中在研究和观察低指数现象的TCO薄膜上。我们最近对掺铝氧化锌薄膜的研究表明,低折射率材料既能增强负折射,又能产生具有大室温拉比频率的强耦合等离子体系统。我们的工作表明,在等离子体和纳米光子器件中加入透明导电氧化物的巨大潜力,为实用技术和科学理解的深入提供了进步。
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Oxide-based Materials and Devices X
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